Effects of substrate temperatures on the structure and properties of hafnium dioxide films

被引：17
作者：
Jiao, Hongfei [1 ,2 ,3 ]
Cheng, Xinbin [1 ,2 ]
Lu, Jiangtao [1 ,2 ]
Bao, Ganghua [1 ,2 ]
Liu, Yongli [1 ,2 ]
Ma, Bin [1 ,2 ,3 ]
He, Pengfei [3 ]
Wang, Zhanshan [1 ,2 ]
机构：
[1] Tongji Univ, Dept Phys, Inst Precis Opt Engn, Shanghai 200092, Peoples R China
[2] Shanghai Key Lab Special Artificial Microstruct M, Shanghai 200092, Peoples R China
[3] Tongji Univ, Sch Aerosp Engn & Appl Mech, Shanghai 200092, Peoples R China
来源：
APPLIED OPTICS | 2011年 / 50卷 / 09期
基金：
中国博士后科学基金; 中国国家自然科学基金;
关键词：
ION-ASSISTED DEPOSITION; THIN-FILMS; OPTICAL-PROPERTIES; REACTIVE EVAPORATION; HFO2; COATINGS;
D O I：
10.1364/AO.50.00C309
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
Different HfO2 monolayers under different deposition conditions, such as substrate temperature and oxygen partial pressure, were prepared from metal hafnium using the reactive electron beam evaporation method. X-ray diffraction was applied to determine the crystalline phase of these films, the surface morphology of the samples was examined by atomic force microscopy, and the optical properties were analyzed using a spectrophotometer and the surface thermal lens technique. The relationship between substrate temperature and film characteristic was investigated, and the correlation between the observed film properties and the laser damage threshold was also discussed. (C) 2011 Optical Society of America
引用
收藏
页码：C309 / C315
页数：7
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