Wafer-Bonded Silicon Gamma-Ray Detectors

被引:0
作者
Wulf, Eric A. [1 ]
Hobart, Karl D. [1 ]
Kub, Francis J. [1 ]
Kurfess, James D. [1 ]
Phlips, Bernard F. [1 ]
Tadjer, Marko [2 ]
机构
[1] Naval Res Lab Washingt, Washington, DC 20375 USA
[2] Univ Maryland, College Pk, MD 20742 USA
来源
2006 IEEE NUCLEAR SCIENCE SYMPOSIUM CONFERENCE RECORD, VOL 1-6 | 2006年
关键词
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暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Direct hydrophobic wafer bonding was used to create a 1 mm thick gamma-ray detector from two 0.5 mm thick wafers. Full depletion and efficient charge transport across the wafer bond is demonstrated. The energy resolution of the detector is 8.9 keV FWHM for 60 keV gamma rays at room temperature with a leakage of 3.5 mu A while operating at 700 V. Improvements in the technique should allow for thicker detectors with better energy resolution.
引用
收藏
页码:1624 / 1629
页数:6
相关论文
共 10 条
[1]  
ESSER R, 2004, Patent No. 6787885
[2]   Directional diffusion and void formation at a Si (001) bonded wafer interface [J].
Esser, RH ;
Hobart, KD ;
Kub, FJ .
JOURNAL OF APPLIED PHYSICS, 2002, 92 (04) :1945-1949
[3]   Characterization of Si pn junctions fabricated by direct wafer bonding in ultra-high vacuum [J].
Hobart, KD ;
Twigg, ME ;
Kub, FJ ;
Desmond, CA .
APPLIED PHYSICS LETTERS, 1998, 72 (09) :1095-1097
[4]   A 6 kV thyristor fabricated by direct wafer bonding [J].
Hobart, KD ;
Kub, FJ ;
Pattanayak, D ;
Piccone, D ;
Patel, M ;
Hits, D ;
Rodrigues, R ;
Ayele, G ;
Colinge, CA .
ISPSD'01: PROCEEDINGS OF THE 13TH INTERNATIONAL SYMPOSIUM ON POWER SEMICONDUCTOR DEVICES & ICS, 2001, :211-214
[5]  
Hobart KD, 2001, ISPSD'01: PROCEEDINGS OF THE 13TH INTERNATIONAL SYMPOSIUM ON POWER SEMICONDUCTOR DEVICES & ICS, P125, DOI 10.1109/ISPSD.2001.934572
[6]  
HOBART KD, 2006, ECS T, V3, P59
[7]  
KUB F, 2001, Patent No. 6194290
[8]  
Ordonez CE, 1998, 1997 IEEE NUCLEAR SCIENCE SYMPOSIUM - CONFERENCE RECORD, VOLS 1 & 2, P1361
[9]  
PHLIPS B, 2006, IEEE T NUC SCI
[10]  
PHLIPS BF, 2004, WAFER BONDED SILICON