Field emission characteristics of high-energy ion-irradiated polycrystalline diamond thin films

被引：11
|
作者：
Pandey, PT
Sharma, GL
Awasthi, DK
Vankar, VD
机构：
[1] Indian Inst Technol, Dept Phys, Thin Film Lab, New Delhi 110016, India
[2] Ctr Nucl Sci, New Delhi 110067, India
来源：
VACUUM | 2003年 / 72卷 / 03期
关键词：
diamond; chemical vapor deposition; field emission; ion irradiation;
D O I：
10.1016/j.vacuum.2003.08.007
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Diamond thin films have been synthesized by hot-filament chemical vapor deposition process using a mixture of methane and hydrogen gases. The samples were subjected to very high-energy ion irradiation (100 MeV Au7+ ions). The field emission characteristics of ion-irradiated samples have been studied. High emission currents and low turn-on and threshold fields were obtained for ion-irradiated samples. The as-deposited and the ion-irradiated samples have been characterized by X-ray Diffraction, Scanning Electron Microscopy and Micro-Raman Spectroscopy techniques and the resulting changes are correlated with field emission results. (C) 2003 Elsevier Ltd. All rights reserved.
引用
收藏
页码：297 / 305
页数：9
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