Electrodeposition of Cu-Al alloys and underpotential deposition of Al onto Cu single crystals from a room-temperature chloroaluminate molten salt

被引：6

作者：

Stafford, GR ^{[1
]}

Jovic, VD

Hussey, CL

机构：

[1] Natl Inst Stand & Technol, Mat Sci & Engn Lab, Gaithersburg, MD 20899 USA

[2] Univ Mississippi, Dept Chem, University, MS 38677 USA

来源：

TRENDS IN ADVANCED MATERIALS AND PROCESSES | 2000年 / 352卷

关键词：

Cu(100); Cu(110); Cu(111); Cu-Al alloys; electrodeposition; phase composition; room-temperature molten salt; UPD of Al;

D O I：

10.4028/www.scientific.net/MSF.352.49

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：49 / 55

页数：7

共 16 条

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