Effect of hydrofluoric acid concentration and etching duration on select surface roughness parameters for zirconia

被引:53
|
作者
Smielak, Beata [1 ]
Klimek, Leszek [2 ,3 ]
机构
[1] Med Univ Lodz, Dept Dent Prosthet, PL-92213 Lodz, Poland
[2] Med Univ Lodz, Dept Mat Res, Inst Mat Sci & Engn, PL-92213 Lodz, Poland
[3] Med Univ Lodz, Dept Dent Technol, PL-92213 Lodz, Poland
关键词
SHEAR BOND STRENGTH; Y-TZP; FLEXURAL STRENGTH; RESIN; CERAMICS; CEMENTS; AGENTS;
D O I
10.1016/j.prosdent.2015.01.001
中图分类号
R78 [口腔科学];
学科分类号
1003 ;
摘要
Statement of problem. The surface of zirconia is resistant to chemical treatment. Roughening the surface of densely sintered zirconia still poses a challenge in dentistry. Purpose. The purpose of the study was to examine the effects of hydrofluoric acid on the quality of surface roughening of zirconia. Material and methods. One hundred cylindrical disks made from zirconia (Ceramill Zi; Amann Girrbach AG) were divided into 4 groups. Three groups (n=30) were distinguished on the basis of hydrofluoric acid (HF) concentration: 40% HF, 9.5% HF, and 5% HF. The groups were then further divided into 3 groups of 10 specimens, each based on etch time (1, 5, or 15 minutes). The control group (n=10) consisted of specimens polished with SiC abrasive paper. The surface was examined with scanning electron microscopy, and the roughness was measured with a profilometer and confocal laser scanning microscope. The mean arithmetic profile deviation (Ra-mean) and mean maximum height of profile (Rz(mean)) results for the etched surfaces in relati onship tean, o the baseline surfaces were compared with the Student t test for averaged data (alpha=.05). Results. When etched with 40% HF concentration, the Ra-mean and Rz(mean) results were statistically higher (P<.01) for the etched surfaces than for the baseline surfaces. When etched with 9.5% HF concentration, the higher Ra-mean and Rz(mean) results were only statistically significant (P<.01) after 15 minutes. Etching with 5% HF concentration showed no significant differences (P>.05). Conclusions. Etching with a 5% HF solution should not be recommended as a method for roughening zirconia surfaces.
引用
收藏
页码:596 / 602
页数:7
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