Characterization of an Ar/O2 magnetron sputtering plasma using a Langmuir probe and an energy resolved mass spectrometer

被引：6
|
作者：
Palmero, A [1 ]
van Hattum, ED [1 ]
Rudolph, H [1 ]
Habraken, FHPM [1 ]
机构：
[1] Univ Utrecht, Debye Inst, Dept Phys & Astron, NL-3508 TA Utrecht, Netherlands
来源：
THIN SOLID FILMS | 2006年 / 494卷 / 1-2期
关键词：
magnetron sputtering; cathode poisoning; Langmuir probe;
D O I：
10.1016/j.tsf.2005.07.154
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
An argon plasma with a small amount of oxygen in a radio-frequency magnetron sputtering system has been studied experimentally. A Langmuir probe has been used to measure the ion density, electron temperature and plasma potential in the plasma, whereas an energy-resolved mass spectrometer has been used to investigate the ions flowing towards the growing film. It has been found that the argon ion density decreases when the oxygen gas is added to the plasma above a certain flow. A discussion on which process is responsible for this effect is presented. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码：18 / 22
页数：5
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