An integrated Silicon Drift Detector System for FEI Schottky Field Emission Transmission Electron Microscopes

被引:48
作者
von Harrach, H. S. [1 ]
Dona, P. [1 ]
Freitag, B. [1 ]
Soltau, H. [2 ]
Niculae, A. [2 ]
Rohde, M. [3 ]
机构
[1] FEI Co, NL-5600 KA Eindhoven, Netherlands
[2] PN Sensor GmbH, D-81739 Munich, Germany
[3] Bruker AXS Microanal GmbH, D-12489 Berlin, Germany
关键词
D O I
10.1017/S1431927609094288
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
[No abstract available]
引用
收藏
页码:208 / 209
页数:2
相关论文
共 3 条
[1]   SEMICONDUCTOR DRIFT CHAMBER - AN APPLICATION OF A NOVEL CHARGE TRANSPORT SCHEME [J].
GATTI, E ;
REHAK, P .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT, 1984, 225 (03) :608-614
[2]   Detection of single atoms and buried defects in three dimensions by aberration-corrected electron microscope with 0.5-Å information limit [J].
Kisielowski, C. ;
Freitag, B. ;
Bischoff, M. ;
van Lin, H. ;
Lazar, S. ;
Knippels, G. ;
Tiemeijer, P. ;
van der Stam, M. ;
von Harrach, S. ;
Stekelenburg, M. ;
Haider, M. ;
Uhlemann, S. ;
Mueller, H. ;
Hartel, P. ;
Kabius, B. ;
Miller, D. ;
Petrov, I. ;
Olson, E. A. ;
Donchev, T. ;
Kenik, E. A. ;
Lupini, A. R. ;
Bentley, J. ;
Pennycook, S. J. ;
Anderson, I. M. ;
Minor, A. M. ;
Schmid, A. K. ;
Duden, T. ;
Radmilovic, V. ;
Ramasse, Q. M. ;
Watanabe, M. ;
Erni, R. ;
Stach, E. A. ;
Denes, P. ;
Dahmen, U. .
MICROSCOPY AND MICROANALYSIS, 2008, 14 (05) :469-477
[3]   PRECISION AND SENSITIVITY IN ELECTRON MICROPROBE ANALYSIS [J].
ZIEBOLD, TO .
ANALYTICAL CHEMISTRY, 1967, 39 (08) :858-&