An Angle-resolved TOF Study on the UV Laser Ablation of Tantalum Oxide

被引:5
|
作者
Han Zhenhui [1 ]
Lu Jianjiang [1 ]
Dang Haijun [1 ]
Dai Ziguo [1 ]
Qin Qizong [1 ]
机构
[1] Fudan Univ, Laser Chem Inst, Shanghai 200433, Peoples R China
关键词
Ta2O5; Laser ablation; Time-of-flight spectrometry; Angular distribution;
D O I
10.3866/PKU.WHXB19970208
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
UV pulsed laser ablation of tantalum oxide at 355nm has been investigated by angle rest time-of-flight quadrupole mass spectrometric method. The measured TOF spectra show that the main ablation neutral products are O, Ta, TaO and TaO2, and the corresponding ionic species are observed with increasing the laser fluence, Their TOF spectra can be fitted by multicomponent Maxwell-Bolztmann distributions with a center-of-mass velocity, and the translational energies of the ionic species are independent on the laser fluence under our experimental conditions, The angular distributions of the ionic and neutral ablation products can be fitted by the expressions of acos(n)theta (n approximate to 26) and acos theta+bcos(n)theta (n approximate to 27), respectively, Possible mechanisms for the production of these species in the UV laser ablation process are discussed.
引用
收藏
页码:140 / 145
页数:6
相关论文
共 8 条
  • [1] ENHANCEMENT OF THE DIELECTRIC-CONSTANT OF TA2O5 THROUGH SUBSTITUTION WITH TIO2
    CAVA, RF
    PECK, WF
    KRAJEWSKI, JJ
    [J]. NATURE, 1995, 377 (6546) : 215 - 217
  • [2] PULSED LASER DEPOSITION HISTORY AND LASER-TARGET INTERACTIONS
    CHEUNG, J
    HORWITZ, J
    [J]. MRS BULLETIN, 1992, 17 (02) : 30 - 36
  • [3] CHRISEY DB, 1995, LASER FOCUS WORL MAY, P115
  • [4] COSMA G, 1985, SURF SCI REP, V5, P145
  • [5] HESS P, 1989, TOP CURR PHYS, V47, P55
  • [6] LASER-INDUCED SPUTTERING OF OXIDES AND COMPOUND SEMICONDUCTORS
    NAKAYAMA, T
    OKIGAWA, M
    ITOH, N
    [J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1984, 1 (2-3) : 301 - 306
  • [7] DEPOSITION OF TANTALUM OXIDE-FILMS BY ARF EXCIMER LASER CHEMICAL VAPOR-DEPOSITION
    NISHIMURA, Y
    TOKUNAGA, K
    TSUJI, M
    [J]. THIN SOLID FILMS, 1993, 226 (01) : 144 - 148
  • [8] LASER PHOTOCHEMICAL ABLATION OF CDWO4 STUDIED WITH THE TIME-OF-FLIGHT MASS-SPECTROMETRIC TECHNIQUE
    TANAKA, K
    MIYAJIMA, T
    SHIRAI, N
    ZHUANG, Q
    NAKATA, R
    [J]. JOURNAL OF APPLIED PHYSICS, 1995, 77 (12) : 6581 - 6587