Nanostructures fabrication on Ta thin film using atomic force microscope lithography

被引：5

作者：

Lee, S

Lee, H ^{[1
]}

Lee, DH

Park, BJ

Yeom, GY

机构：

[1] Hanyang Univ, Dept Chem, Seoul 133791, South Korea

[2] Natl Program Tera Level Nanodevices, Seoul, South Korea

[3] Sungkyunkwan Univ, Dept Mat Sci & Engn, Suwon 440746, South Korea

来源：

MOLECULAR CRYSTALS AND LIQUID CRYSTALS | 2006年 / 445卷 / 115/[405]-118/[408]期

关键词：

atomic force microscope (AFM) lithography; etching; nanopattern; Ta;

D O I：

10.1080/15421400500369484

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Atomic force microscope ( AFM) lithography based on localized current injection was carried out for fabricating nanostructures of metal oxide on tantalum ( Ta). Fabricated nanopatterns of tantalum oxide ( Ta2O5) were selectively etched by magnetically enhanced inductively coupled plasma ( MEICP) etching system. Nanopatterns of Ta with feature size in the range of a few tens-hundreds nm were successfully fabricated.

引用

页码：115 / 118

页数：4

共 5 条

[1] FABRICATION OF NANOMETER-SCALE SIDE-GATED SILICON FIELD-EFFECT TRANSISTORS WITH AN ATOMIC-FORCE MICROSCOPE [J].