A low-temperature synthesis of electrochemical active Pt nanoparticles and thin films by atomic layer deposition on Si(111) and glassy carbon surfaces

被引：6

作者：

Liu, Rui ^{[1
]}

Han, Lihao ^{[1
,2
]}

Huang, Zhuangqun ^{[1
,4
]}

Ferrer, Ivonne M. ^{[1
,4
]}

Smets, Arno H. M. ^{[2
]}

Zeman, Miro ^{[2
]}

Brunschwig, Bruce S. ^{[3
]}

Lewis, Nathan S. ^{[1
,3
,4
,5
]}

机构：

[1] CALTECH, Joint Ctr Artificial Photosynth, Pasadena, CA 91125 USA

[2] Delft Univ Technol, Photovolta Mat & Devices PVMD Lab, NL-2600 GA Delft, Netherlands

[3] CALTECH, Beckman Inst, Pasadena, CA 91125 USA

[4] CALTECH, Div Chem & Chem Engn, Pasadena, CA 91125 USA

[5] CALTECH, Kavli Nanosci Inst, Pasadena, CA 91125 USA

来源：

THIN SOLID FILMS | 2015年 / 586卷

关键词：

Atomic layer deposition; Platinum; Nanoparticles; Thin films; Water splitting; Hydrogen evolution; HYDROGEN-EVOLUTION; WATER OXIDATION; NOBLE-METALS; PLATINUM; PHOTOCATHODES; CATALYSTS; OXYGEN; GENERATION; ELECTRODES; REDUCTION;

D O I：

10.1016/j.tsf.2015.04.018

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Atomic layer deposition (ALD) was used to deposit nanoparticles and thin films of Pt onto etched p-type Si(111) wafers and glassy carbon discs. Using precursors of MeCpPtMe3 and ozone and a temperature window of 200-300 degrees C, the growth rate was 80-110 pm/cycle. X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), and scanning electron microscopy (SEM) were used to analyze the composition, structure, morphology, and thickness of the ALD-grown Pt nanoparticle films. The catalytic activity of the ALD-grown Pt for the hydrogen evolution reaction was shown to be equivalent to that of e-beam evaporated Pt on glassy carbon electrode. (C) 2015 Elsevier B.V. All rights reserved.

引用

页码：28 / 34

页数：7

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