Experimental characterization of Inverse- Designed Vertical Grating Couplers in the O-band

被引：2
|
作者：
Van Vaerenbergh, Thomas [1 ]
Hooten, Sean [2 ]
Sun, Peng [2 ]
Jain, Mudit [2 ]
Seyedi, Ashkan [2 ]
Huang, Zhihong [2 ]
Fiorentino, Marco [2 ]
Beausoleil, Ray [2 ]
机构：
[1] HPE, Hewlett Packard Labs, LSIP Lab, Diegem, Belgium
[2] HPE, Hewlett Packard Labs, LSIP Lab, Milpitas, CA USA
来源：
2021 ANNUAL CONFERENCE OF THE IEEE PHOTONICS SOCIETY (IPC) | 2021年
关键词：
Silicon photonics; Gratings; Photonic integrated circuits;
D O I：
10.1109/IPC48725.2021.9592923
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
We perform wafer-level testing of perfectly vertical grating couplers in a c-Si 193nm DUV immersion lithography process. We designed single polarization grating couplers using the adjoint method and experimentally obtain an insertion loss of 1.91dB, a 18.9nm 1dB-bandwidth, and <-10dB in-waveguide reflection.
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页数：2
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