Optical characterization of indium-tin-oxynitride fabricated by RF-sputtering

被引：11
|
作者：
Aperathitis, E
Modreanu, M
Bender, M
Cimalla, V
Ecke, G
Androulidaki, M
Pelekanos, N
机构：
[1] Fdn Res & Technol Hellas, Microelect Res Grp, Inst Elect Struct & Laser, Iraklion, Crete, Greece
[2] Natl Univ Ireland Univ Coll Cork, Natl Microelect Res Ctr, Photon Grp, Cork, Ireland
[3] Appl Films GMBH & Co KG, D-63755 Alzenau, Germany
[4] Tech Univ Ilmenau, Ctr Micro & Nanotechnol, ZMN, D-98684 Ilmenau, Germany
来源：
THIN SOLID FILMS | 2004年 / 450卷 / 01期
关键词：
indium tin oxide; nitrides; sputtering; optical properties; structural properties; conductivity;
D O I：
10.1016/j.tsf.2003.10.046
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Indium-tin-oxynitride (ITON) and indium-tin-oxide (ITO) thin films have been fabricated by r.f. sputtering from an indium-tin-oxide target in a plasma containing N-2 and Ar gases, respectively. The properties of films grown at two different plasma pressures were examined just after deposition and after annealing. Although the electrical properties of these films were improved after annealing, the properties of the ITON films were still inferior to those of the ITO films. The resistivity of the ITON films after annealing was reduced by a factor of two for the film at the higher plasma pressure, but the carrier concentration was almost the same. The ITON films fabricated at low pressure exhibited a significant blue shift in transmittance, which was not related to the increase carrier concentration after annealing. (C) 2003 Elsevier B.V. All rights reserved.
引用
收藏
页码：101 / 104
页数：4
相关论文
共 50 条
  • [41] Electrochromic characterization of amorphous tungsten oxide films deposited on indium tin oxide and CVD-graphene electrodes by RF magnetron sputtering
    Choi, Dong Soo
    Han, Seung Ho
    Kim, Hyeongkeun
    Kim, Tae Young
    Rhyu, Se Hyun
    Yoon, Dae Ho
    Yang, Woo Seok
    JOURNAL OF CERAMIC PROCESSING RESEARCH, 2014, 15 (04): : 273 - 276
  • [42] Er3+/Yb3+-activated silica-hafnia planar waveguides for photonics fabricated by rf-sputtering
    Chiasera, A.
    Armellini, C.
    Bhaktha, S. N. B.
    Chiappini, A.
    Jestin, Y.
    Ferrari, M.
    Moser, E.
    Coppa, A.
    Foglietti, V.
    Huy, P. T.
    Ngoc, K. Tran
    Conti, G. Nunzi
    Pelli, S.
    Righini, G. C.
    Speranza, G.
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 2009, 355 (18-21) : 1176 - 1179
  • [43] Properties of indium tin oxide films prepared by rf reactive magnetron sputtering at different substrate temperature
    Meng, LJ
    dos Santos, MP
    THIN SOLID FILMS, 1998, 322 (1-2) : 56 - 62
  • [44] High Quality Indium Tin Oxide (ITO) Film Growth by Controlling Pressure in RF Magnetron Sputtering
    Aliyu, M. M.
    Hossain, S.
    Husna, J.
    Dhar, N.
    Huda, M. Q.
    Sopian, K.
    Amin, N.
    2012 38TH IEEE PHOTOVOLTAIC SPECIALISTS CONFERENCE (PVSC), 2012, : 2009 - 2013
  • [45] Surface, Structural, and Optical Properties in the ZnO Films Grown on Al2O3 and GaN Substrates by Using RF-Sputtering
    Ko, Hang-Ju
    Kim, Kang-Bok
    Lee, Soo-Man
    Jang, Tae-Soo
    Oh, Dong-Cheol
    JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, 2017, 17 (05) : 3272 - 3278
  • [46] Indium tin oxide thin films by bias magnetron rf sputtering for heterojunction solar cells application
    Zhao, L
    Zhou, ZB
    Peng, H
    Cui, RQ
    APPLIED SURFACE SCIENCE, 2005, 252 (02) : 385 - 392
  • [47] Study of Annealed Nickel (Ni)/Indium Tin Oxide (ITO) Nanostructures Prepared by RF Magnetron Sputtering
    Sobri, M.
    Shuhaimi, A.
    Hakim, K. M.
    Mamat, M. H.
    Najwa, S.
    Mazwan, M.
    Ameera, A.
    Musa, M. Z.
    Rusop, M.
    NANOSCIENCE, NANOTECHNOLOGY AND NANOENGINEERING, 2014, 832 : 695 - +
  • [48] Er3+/Yb3+ -: activated silica-hafnia planar waveguides for photonics fabricated by rf-sputtering
    Chiasera, A.
    Bhaktha, S. N. B.
    Brenci, M.
    Chiappini, A.
    Ferrari, M.
    Foglietti, V.
    Goncalves, R. R.
    Jestin, Y.
    Minotti, A.
    Montagna, M.
    Moser, E.
    Pelli, S.
    Righini, G. C.
    Tosello, C.
    Vishnubhatla, K. C.
    Integrated Optics, Silicon Photonics, and Photonic Integrated Circuits, 2006, 6183 : O1830 - O1830
  • [49] Transparent-conductive indium tin oxide films fabricated by atmospheric rf plasma deposition technique
    Lee, DH
    Moss, RW
    Vuong, KD
    Dietrich, M
    Condrate, RA
    Wang, XW
    THIN SOLID FILMS, 1996, 290 : 6 - 9
  • [50] Optical Analysis of RF Sputtering Plasma through Colour Characterization
    Salimian, Ali
    Haghpanahan, Roohollah
    Hasnath, Abul
    Upadhyaya, Hari
    COATINGS, 2019, 9 (05)
12345