Optical characterization of indium-tin-oxynitride fabricated by RF-sputtering

被引：11
|
作者：
Aperathitis, E
Modreanu, M
Bender, M
Cimalla, V
Ecke, G
Androulidaki, M
Pelekanos, N
机构：
[1] Fdn Res & Technol Hellas, Microelect Res Grp, Inst Elect Struct & Laser, Iraklion, Crete, Greece
[2] Natl Univ Ireland Univ Coll Cork, Natl Microelect Res Ctr, Photon Grp, Cork, Ireland
[3] Appl Films GMBH & Co KG, D-63755 Alzenau, Germany
[4] Tech Univ Ilmenau, Ctr Micro & Nanotechnol, ZMN, D-98684 Ilmenau, Germany
来源：
THIN SOLID FILMS | 2004年 / 450卷 / 01期
关键词：
indium tin oxide; nitrides; sputtering; optical properties; structural properties; conductivity;
D O I：
10.1016/j.tsf.2003.10.046
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Indium-tin-oxynitride (ITON) and indium-tin-oxide (ITO) thin films have been fabricated by r.f. sputtering from an indium-tin-oxide target in a plasma containing N-2 and Ar gases, respectively. The properties of films grown at two different plasma pressures were examined just after deposition and after annealing. Although the electrical properties of these films were improved after annealing, the properties of the ITON films were still inferior to those of the ITO films. The resistivity of the ITON films after annealing was reduced by a factor of two for the film at the higher plasma pressure, but the carrier concentration was almost the same. The ITON films fabricated at low pressure exhibited a significant blue shift in transmittance, which was not related to the increase carrier concentration after annealing. (C) 2003 Elsevier B.V. All rights reserved.
引用
收藏
页码：101 / 104
页数：4
相关论文
共 50 条
  • [1] EFFECT OF RF-SPUTTERING POWER ON PLASMA PARAMETERS AND OPTICAL PROPERTIES OF TiN COATING
    Mahmood, M. A.
    Khalaf, M. K.
    Noori, Farah T. M.
    DIGEST JOURNAL OF NANOMATERIALS AND BIOSTRUCTURES, 2019, 14 (03) : 735 - 742
  • [2] Characterization of NiO Films with the Process Variables in the RF-Sputtering
    Chung, Kook Chae
    Kim, Young Kuk
    Choi, Chul Jin
    KOREAN JOURNAL OF METALS AND MATERIALS, 2010, 48 (04): : 320 - 325
  • [3] Optical properties of zinc nitride thin films fabricated by rf-sputtering from ZnN target
    Voulgaropouou, P.
    Dounis, S.
    Kambilafka, V.
    Androulidaki, M.
    Ruzinsky, M.
    Saly, V.
    Prokein, P.
    Viskadourakis, Z.
    Tsagaraki, K.
    Aperathitis, E.
    THIN SOLID FILMS, 2008, 516 (22) : 8170 - 8174
  • [4] Effect of Substrates Temperature on Structural and Optical Properties Indium Tin Oxide prepared by RF Magnetron Sputtering
    Nasir, Mohammad Farid Bin Mohd
    Mamat, Mohamad Hafiz
    PROCEEDINGS OF THE 14TH IEEE STUDENT CONFERENCE ON RESEARCH AND DEVELOPMENT (SCORED), 2016,
  • [5] Characterization of MgO thin films grown by rf-sputtering
    Cáceres, D
    Colera, I
    Vergara, I
    González, R
    Román, E
    VACUUM, 2002, 67 (3-4) : 577 - 581
  • [6] Effects of plasma treatment on the electrical and optical properties of indium tin oxide films fabricated by r.f. reactive sputtering
    Lee, CT
    Yu, QX
    Tang, BT
    Lee, HY
    THIN SOLID FILMS, 2001, 386 (01) : 105 - 110
  • [7] GeO2 glass ceramic planar waveguides fabricated by RF-sputtering
    Chiasera, A.
    Macchi, C.
    Mariazzi, S.
    Valligatla, S.
    Varas, S.
    Mazzola, M.
    Bazzanella, N.
    Lunelli, L.
    Pederzolli, C.
    Rao, D. N.
    Righini, G. C.
    Somoza, A.
    Brusa, R. S.
    Ferrari, M.
    OPTICAL COMPONENTS AND MATERIALS XI, 2014, 8982
  • [8] Effect of Annealing on the Properties of Indium-Tin-Oxynitride Films as Ohmic Contacts for GaN-Based Optoelectronic Devices
    Himmerlich, Marcel
    Koufaki, Maria
    Ecke, Gernot
    Mauder, Christof
    Cimalla, Volker
    Schaefer, Juergen A.
    Kondilis, Antonis
    Pelekanos, Nikos T.
    Modreanu, Mircea
    Krischok, Stefan
    Aperathitis, Elias
    ACS APPLIED MATERIALS & INTERFACES, 2009, 1 (07) : 1451 - 1456
  • [9] The effects of oxygen content on electrical and optical properties of indium tin oxide films fabricated by reactive sputtering
    Honda, S
    Watamori, M
    Oura, K
    THIN SOLID FILMS, 1996, 281 : 206 - 208
  • [10] Influence of RF Magnetron Sputtering Pressure on the Structural, Optical, and Morphological Properties of Indium Tin Oxide Nanocolumns
    Najwa, S.
    Shuhaimi, A.
    Ameera, N.
    Hakim, K. M.
    Sobri, M.
    Mazwan, M.
    Mamat, M. H.
    Musa, M. Z.
    Rusop, M.
    NANOSCIENCE, NANOTECHNOLOGY AND NANOENGINEERING, 2014, 832 : 276 - +
12345