Luminescent lanthanide-based hybrid coatings deposited by atmospheric pressure plasma assisted chemical vapour deposition

被引:19
|
作者
Boscher, Nicolas D. [1 ]
Choquet, Patrick [1 ]
Duday, David [1 ]
Kerbellec, Nicolas [2 ]
Lambrechts, Jean-Christophe [1 ]
Maurau, Remy [1 ]
机构
[1] Ctr Rech Publ Gabriel Lippmann, Dept Sci & Anal Mat, L-4422 Belvaux, Luxembourg
[2] OLNICA, F-35708 Rennes, France
关键词
THIN-FILMS; RARE-EARTH; CORROSION;
D O I
10.1039/c1jm14659a
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
A new atmospheric pressure plasma route toward the formation of smart hybrid coatings is presented. As an example, luminescent lanthanide-containing coordination polymers were embedded in a silica matrix.
引用
收藏
页码:18959 / 18961
页数:3
相关论文
共 50 条
  • [41] Atmospheric Pressure Chemical Vapour Deposition of Electrochromic Mo-W Oxide Films: Structure and Optoelectronic Properties
    Ivanova, T.
    Gesheva, K. A.
    Lebedev, O.
    Kalitzova, M.
    Bojadjiev, S.
    EUROCVD 17 / CVD 17, 2009, 25 (08): : 213 - 220
  • [42] Ion beam assisted chemical vapor deposition of hybrid coatings-Process diagnostics and mechanisms
    Shelemin, Artem
    Zabeida, Oleg
    Klemberg-Sapieha, Jolanta-Ewa
    Martinu, Ludvik
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2021, 39 (06): : 1ENG
  • [43] Fabrication and Electrical Characteristics of Schottky Diode on Ag/Poly-Si Deposited by Sub Atmospheric Pressure Chemical Vapor Deposition and Low Pressure Chemical Vapor Deposition
    Benseddik, N.
    Amrani, M.
    Benamara, Z.
    Mazari, H.
    Brahim, T. Mohammed
    SENSOR LETTERS, 2009, 7 (05) : 721 - 724
  • [44] Effect of plasma composition on nanocrystalline diamond layers deposited by a microwave linear antenna plasma-enhanced chemical vapour deposition system
    Taylor, Andrew
    Ashcheulov, Petr
    Cada, Martin
    Fekete, Ladislav
    Hubik, Pavel
    Klimsa, Ladislav
    Olejnicek, Jiri
    Remes, Zdenek
    Jirka, Ivan
    Janicek, Petr
    Bedel-Pereira, Elena
    Kopecek, Jaromir
    Mistrik, Jan
    Mortet, Vincent
    PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 2015, 212 (11): : 2418 - 2423
  • [45] Influence of H2/SiH4 ratio on the deposition rate and morphology of polycrystalline silicon films deposited by atmospheric pressure plasma chemical vapor deposition
    Ohmi, Hiromasa
    Kakiucht, Hiroaki
    Yasutake, Kiyoshi
    Nakahama, Yasuji
    Ebata, Yusuke
    Yoshii, Kumayasu
    Mori, Yuzo
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 2006, 45 (4 B): : 3581 - 3586
  • [46] GaN film fabrication by near-atmospheric plasma-assisted chemical vapor deposition
    Nagata, Takahiro
    Sakuma, Yoshiki
    Uehara, Tsuyoshi
    Chikyow, Toyohiro
    Japanese Journal of Applied Physics, Part 2: Letters, 2007, 46 (1-3):
  • [47] Structure, wear and corrosion behaviours of Cr-Al-C and multilayer [Cr-Al-C/a-C]n coatings fabricated by physical vapour deposition and plasma-assisted chemical vapour deposition techniques
    Rubshtein, A. P.
    Gao, K.
    Vladimirova, A. B.
    Plotnikov, S. A.
    Zhang, B.
    Zhang, J.
    SURFACE & COATINGS TECHNOLOGY, 2019, 377
  • [48] Combinatorial atmospheric pressure chemical vapour deposition (cAPCVD) of niobium doped anatase; effect of niobium on the conductivity and photocatalytic activity
    Kafizas, Andreas
    Dunnill, Charles. W.
    Parkin, Ivan P.
    JOURNAL OF MATERIALS CHEMISTRY, 2010, 20 (38) : 8336 - 8349
  • [49] Atmospheric pressure plasma enhanced chemical vapor deposition of zinc oxide and aluminum zinc oxide
    Johnson, Kyle W.
    Guruvenket, Srinivasan
    Sailer, Robert A.
    Ahrenkiel, S. Phillip
    Schulz, Douglas L.
    THIN SOLID FILMS, 2013, 548 : 210 - 219
  • [50] Thermochromic vanadium dioxide thin films prepared by electric field assisted atmospheric pressure chemical vapour deposition for intelligent glazing application and their energy demand reduction properties
    Warwick, Michael E. A.
    Ridley, Ian
    Binions, Russell
    SOLAR ENERGY MATERIALS AND SOLAR CELLS, 2016, 157 : 686 - 694