Luminescent lanthanide-based hybrid coatings deposited by atmospheric pressure plasma assisted chemical vapour deposition

被引：19

作者：

Boscher, Nicolas D. ^{[1
]}

Choquet, Patrick ^{[1
]}

Duday, David ^{[1
]}

Kerbellec, Nicolas ^{[2
]}

Lambrechts, Jean-Christophe ^{[1
]}

Maurau, Remy ^{[1
]}

机构：

[1] Ctr Rech Publ Gabriel Lippmann, Dept Sci & Anal Mat, L-4422 Belvaux, Luxembourg

[2] OLNICA, F-35708 Rennes, France

来源：

JOURNAL OF MATERIALS CHEMISTRY | 2011年 / 21卷 / 47期

关键词：

THIN-FILMS; RARE-EARTH; CORROSION;

D O I：

10.1039/c1jm14659a

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

A new atmospheric pressure plasma route toward the formation of smart hybrid coatings is presented. As an example, luminescent lanthanide-containing coordination polymers were embedded in a silica matrix.

引用

页码：18959 / 18961

页数：3

共 50 条

[21] Optimization of Solar Cell Performance using Atmospheric Pressure Chemical Vapour Deposition deposited TCOs
Yates, H. M.
Evans, P.
Sheel, D. W.
Hodgkinson, J. L.
Sheel, P.
Dagkaldiran, U.
Gordijn, A.
Finger, F.
Remes, Z.
Vanecek, M.
EUROCVD 17 / CVD 17, 2009, 25 (08): : 789 - 796
[22] Structural properties of zinc oxide deposited using atmospheric pressure combustion chemical vapour deposition
Zunke, I.
Wolf, S.
Heft, A.
Schimanski, A.
Gruenler, B.
Ronning, C.
Seidel, P.
THIN SOLID FILMS, 2014, 565 : 45 - 53
[23] Optimum performance solar cells using atmospheric pressure chemical vapour deposition deposited TCOs
Yates, H. M.
Evans, P.
Sheel, D. W.
Remes, Z.
Vanecek, M.
Dagkaldiran, Ue
Gordijn, A.
Finger, F.
INTERNATIONAL JOURNAL OF NANOTECHNOLOGY, 2009, 6 (09) : 816 - 827
[24] TiOx Films Deposited by Plasma Enhanced Chemical Vapour Deposition Method in Atmospheric Dielectric Barrier Discharge Plasma
Y. Klenko
J. Pichal
Plasma Chemistry and Plasma Processing, 2012, 32 : 1215 - 1225
[25] Conductive zinc oxide thin film coatings by combustion chemical vapour deposition at atmospheric pressure
Zunke, I.
Heft, A.
Schaefer, P.
Haidu, F.
Lehmann, D.
Gruenler, B.
Schimanski, A.
Zahn, D. R. T.
THIN SOLID FILMS, 2013, 532 : 50 - 55
[26] TiOx Films Deposited by Plasma Enhanced Chemical Vapour Deposition Method in Atmospheric Dielectric Barrier Discharge Plasma
Klenko, Y.
Pichal, J.
PLASMA CHEMISTRY AND PLASMA PROCESSING, 2012, 32 (06) : 1215 - 1225
[27] Remote plasma-enhanced chemical vapour deposition of silicon nitride at atmospheric pressure
Nowling, GR
Babayan, SE
Jankovic, V
Hicks, RF
PLASMA SOURCES SCIENCE & TECHNOLOGY, 2002, 11 (01): : 97 - 103
[28] Deposition of indium tin oxide by atmospheric pressure chemical vapour deposition
Gaskell, Jeffrey M.
Sheel, David W.
THIN SOLID FILMS, 2012, 520 (12) : 4110 - 4113
[29] Characterization of zirconia coatings deposited by inductively coupled plasma assisted chemical vapor deposition
Colpo, P
Ceccone, G
Sauvageot, P
Baker, M
Rossi, F
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2000, 18 (04): : 1096 - 1101
[30] Hybrid Aerosol Assisted Atmospheric Pressure Chemical Vapour Deposition: A Facile Route Toward Nano-Composite Thin Films?
Saeli, Manfredi
Piccirillo, Clara
Parkin, Ivan P.
Binions, Russell
EUROCVD 17 / CVD 17, 2009, 25 (08): : 773 - 780

← 1 2 3 4 5 →