Electronic structures and magnetic properties of (Ni,Al) co-doped 4H-SiC: A first-principles study

被引:17
|
作者
Lin, Long [1 ]
Huang, Jingtao [1 ,2 ]
Yu, Weiyang [2 ]
Tao, Hualong [3 ]
Zhu, Linghao [1 ]
Wang, Pengtao [1 ]
Zhang, Zhanying [1 ]
Zhang, Jisheng [1 ]
机构
[1] Henan Polytech Univ, Sch Mat Sci & Engn, Key Lab Environm Friendly Inorgan Mat Henan Prov, Cultivating Base, Jiaozuo 454000, Peoples R China
[2] Henan Polytech Univ, Sch Phys & Elect Informat Engn, Jiaozuo 454000, Peoples R China
[3] Dalian Jiaotong Univ, Sch Mat Sci & Engn, Liaoning Key Mat Lab Railway, Dalian 116028, Liaoning, Peoples R China
基金
中国国家自然科学基金;
关键词
Dilute magnetic semiconductor; Electronic structure; Magnetic property; 4H-SiC; First-principles; AB-INITIO; MEAN-FIELD; 1ST PRINCIPLE; OPTICAL-PROPERTIES; AL; NI; FERROMAGNETISM; STABILITY; COMPOUND;
D O I
10.1016/j.commatsci.2018.08.048
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Based on density functional theory (DFT) first-principles method, we have investigated the electronic structures and magnetic properties of (Ni,Al) co-doped 4H-SiC system. Various configurations of Ni sites have been considered to confirm the most stable geometric construction. Comparing with pure 4H-SiC, the magnetic moment of Ni-doped 4H-SiC is increased, which is attributed to the hybridization of Ni:4s and C:2p orbitals. Moreover, we found that it is the 3d orbital of Ni that induces the spin-polarized state in Ni-doped 4H-SiC. In addition, the origin of ferromagnetic coupling between Ni-doped 4H-SiC has been predicted to be the ferromagnetic orders activated by the Ni-0:3d-C:2p-Ni-2:3d coupling chains. For (Ni,Al) co-doped system, we found that ferromagnetic stability is reduced significantly. For (2Ni, V-Si) co-doped 4H-SiC system, the antiferromagnetic state is more stable than ferromagnetic state with Delta E-FM of 97.2 meV, and the system changes from ferromagnetism to anti-ferromagnetism. These results provide a new route for the potential applications of dilute magnetic semiconductors in spintronic devices by employing doped 4H-SiC.
引用
收藏
页码:169 / 174
页数:6
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