A comparative study of thin films of hole-doped Pr0.6Ca0.4MnO3 and electron-doped Pr0.4Ca0.6MnO3

被引:4
作者
Parashar, S [1 ]
Sarathy, KV [1 ]
Vanitha, PV [1 ]
Raju, AR [1 ]
Rao, CNR [1 ]
机构
[1] Jawaharlal Nehru Ctr Adv Sci Res, Chem & Phys Mat Unit, Bangalore 560064, Karnataka, India
关键词
electronic materials; oxides; vapor deposition; electrical conductivity;
D O I
10.1016/S0022-3697(01)00053-1
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Properties of thin films of hole-doped Pr0.6Ca0.4MnO3 and electron-doped Pr0.4Ca0.6MnO3 are compared. While both are charge-ordered insulators, the hole-doped manganate undergoes an insulator-metal (I-M) transition on the application of magnetic-fields, but the electron-doped manganate does not. Substitution of 3% Cr3+ Or Ru4+ in the Mn site has greater effect on the hole-doped manganate. Electrical fields, however, have similar effects on the hole-doped and electron-doped manganates, both exhibiting current-induced I-M transitions. The study not only establishes that the mechanism of the I-M transition brought about by electric and magnetic fields are different, but also suggests that the electronic structures of the hole-doped and electron-doped manganates have basic differences. (C) 2001 Elsevier Science Ltd. All rights reserved.
引用
收藏
页码:1387 / 1391
页数:5
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