Variation of Color in Zirconium Nitride Thin Films Prepared by Reactive DC Magnetron Sputtering

被引：4
|
作者：
Klumdoung, Pattarinee [1 ,2 ]
Asanithi, Piyapong [1 ]
Chaiyakun, Surasing [2 ]
Limsuwan, Pichet [1 ]
机构：
[1] King Mongkuts Univ Technol, Fac Sci, Dept Phys, Thin Film Technol Res Lab, Bangkok, Thailand
[2] Burapha Univ, Fac Sci, Dept Phys, Vacuum Technol & Thin Films Res Lab, Chon Buri, Thailand
来源：
ADVANCES IN KEY ENGINEERING MATERIALS | 2011年 / 214卷
关键词：
reactive dc magnetron sputtering; zirconium nitride thin films; color; COATINGS; ZRN; TIN;
D O I：
10.4028/www.scientific.net/AMR.214.320
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
This study is to evaluate a color variation of the zirconium nitride thin film, prepared from deposition technique of different N-2 flow rates, ranging from 0.0 to 3.0 seem, whereas the Ar flow rate is fixed at 3 scent. The thin film was deposited on an unheated silicon wafer (100) via a reactive DC magnetron sputtering. The deposition current and deposition time were 0.6 A and 15 minutes, respectively. In the study, colors of film were changed from silver, gold, dark brown, brown, purple, pink to blue. when N2 flow rate further increase. Interestingly, the results indicate that gold color occurs in a very small interval of N-2 flow rate.
引用
收藏
页码：320 / +
页数：2
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