Disappearance of Lowest-Order Transmission Resonance in Ag Film of Critical Thickness

被引：5

作者：

Lu, Shin-Ming ^{[1
,2
]}

Huang, Hsu-Hsing ^{[2
,3
,4
]}

Su, Wei-Bin ^{[1
,2
]}

Chu, Pei-Hong ^{[1
,2
]}

Chang, Chia-Seng ^{[2
]}

Hsiao, Hsi-Lien ^{[1
]}

Tsong, Tien Tzou ^{[2
]}

机构：

[1] Tunghai Univ, Dept Phys, Taichung 407, Taiwan

[2] Acad Sinica, Inst Phys, Taipei 115, Taiwan

[3] Acad Sinica, Taiwan Int Grad Program, Taipei 115, Taiwan

[4] Natl Taiwan Univ, Dept Phys, Taipei 106, Taiwan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 2011年 / 50卷 / 08期

关键词：

QUANTUM-WELL STATES; ELECTRON INTERFEROMETRY; WORK FUNCTION; IMAGE STATES; THIN-FILMS; PHOTOEMISSION; SURFACES; ISLANDS; SPECTROSCOPY; GROWTH;

D O I：

10.1143/JJAP.50.08LB01

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The quantum phenomenon of the transmission resonance can be observed in Ag films grown on a Si(111)7 x 7 surface using scanning tunneling spectroscopy. It is found that the energy of the transmission resonance moves toward lower energy with increasing film thickness. The formula used is derived from quantum mechanics to demonstrate that this lowering in the transmission resonance energy is proportional to (w + 1)(2)/w(2), where w is the number of atomic layers of film thickness. This relation is justified by experimental results, but only holds for thinner films. The formula also predicts that the lowest-order transmission resonance should disappear when the Ag film reaches its critical thickness. This disappearance of the transmission resonance has also been experimentally confirmed in the dI/dV spectrum. (C) 2011 The Japan Society of Applied Physics

引用

页数：5