Large-Scale Uniform Silver Nanocave Array for Visible Light Refractive Index Sensing Using Soft UV Nanoimprint

被引:6
作者
Zhu, Jinfeng [1 ,2 ]
Bai, Yanqiang [1 ,2 ]
Zhang, Lirong [1 ,2 ]
Song, Zhengyong [1 ,2 ]
Liu, Hai [1 ,2 ]
Zhou, Jianyang [1 ,2 ]
Lin, Timothy [3 ]
Liu, Qing Huo [4 ]
机构
[1] Xiamen Univ, Inst Electromagnet & Acoust, Xiamen 361005, Peoples R China
[2] Xiamen Univ, Dept Elect Sci, Xiamen 361005, Peoples R China
[3] Aegis Technol Inc, Santa Ana, CA 92706 USA
[4] Duke Univ, Dept Elect & Comp Engn, Durham, NC 27708 USA
来源
IEEE PHOTONICS JOURNAL | 2016年 / 8卷 / 04期
基金
中国国家自然科学基金;
关键词
Plasmonics; nanoimprint lithography; refractive index sensing; NANOHOLE ARRAYS; OPTICAL-TRANSMISSION; SENSORS; LITHOGRAPHY; CRYSTALS; MERIT;
D O I
10.1109/JPHOT.2016.2585111
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this paper, a wafer-scale uniform silver nanocave array is fabricated by soft ultraviolet nanoimprint lithography. We investigate its plasmonic effects using far-field and near-field experimental approaches and illuminate the physics inside by theoretical analysis and computational simulation. The array shows robust multispectral features for various surrounding media and possesses the sensitivity up to 514.7 nm/RIU in the visible range, which is promising for the mass production of high-performance plasmonic refractive index sensors.
引用
收藏
页数:7
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