High-sensitive giant magnetoresistance in permalloy/Cu multilayers

被引:4
|
作者
Lucinski, T [1 ]
Stobiecki, F [1 ]
Szymanski, B [1 ]
Dubowik, J [1 ]
Schmidt, M [1 ]
Urbaniak, M [1 ]
机构
[1] Polish Acad Sci, Inst Mol Phys, PL-60179 Poznan, Poland
来源
JOURNAL DE PHYSIQUE IV | 1998年 / 8卷 / P2期
关键词
D O I
10.1051/jp4:19982106
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
We report on giant magnetoresistance (GMR) of Si(100)/Cu-20nm/(Py-d(Py)/Cu-d(Cu))(100) where Py=Ni83Fe17, multilayer films prepared by face-to-face sputtering with 0.5 less than or equal to d(Cu)less than or equal to 3.5 nm and 0.5 less than or equal to d(Py)less than or equal to 10 nm. It has been shown that the GMR sensitivity depends on the relative changes of resistivity as well as on the value of the antiferromagnetic interlayer exchange coupling strength J(AF) The highest GMR sensitivity (0.5%/Oe) has been achieved for d(Cu)=2.1 nm and d(Py)=3.5 nm.
引用
收藏
页码:453 / 456
页数:4
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