Half-Metallic Ferromagnetism In V-Doped AlP: An Imperative Compound For Spintronics

被引:4
|
作者
Singh, Hardev [1 ]
Pundir, A. K. [1 ]
Thakur, Jyoti [2 ]
Singh, Mukhtiyar [3 ]
Kashyap, Manish K. [4 ]
机构
[1] Guru Jambheshwar Univ Sci & Technol, Dept Phys, Hisar 125001, Haryana, India
[2] Rajiv Gandhi Govt Coll, Dept Phys, Ambala 133104, Haryana, India
[3] Dayanand Postgrad Coll, Dept Phys, Hisar 125001, Haryana, India
[4] Kurukshetra Univ, Dept Phys, Kurukshetra 136119, Haryana, India
来源
关键词
Half-metallic ferromagnets; DFT; FPLAPW method; DMS; ELECTRONIC-STRUCTURE; GAP; CR;
D O I
10.1063/1.4980737
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
A supercell approach has been used to performed the ground state calculations of Al1-xVxP (x= 0.03) Diluted Magnetic Semiconductor (DMS) compound using full potential linearzed augmented plane wave (FPLAPW) method based on density functional theory (DFT). The calculated properties of bulk InP compound get modified significantly due to the substitution of V-dopant at the cation (Al) site. The new states are produced at E-F which accounts for the magnetism on the doping. In V-doped AlP, the hybridization of P-p states with V-d states introduces a gap in minority spin channel with 100% spin polarization at E-F. The V-doping in AlP induces a net magnetic moment of similar to 2.0 mu(B) which shows an important role played by V-d states in total magnetic moment. The HMF characteristics of V-doped AlP makes it an ideal material for spintronic devices.
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页数:3
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