Stitching interferometric measurement system for hard x-ray nanofocusing mirrors

被引：0

作者：

Yumoto, Hirokatsu ^{[1
]}

Mimura, Hidekazu ^{[1
]}

Handa, Soichiro ^{[1
]}

Kimura, Takashi ^{[1
]}

Matsuyama, Satoshi ^{[1
]}

Sano, Yasuhisa ^{[1
]}

Yabashi, Makina

Nishino, Yoshinori

Tamasaku, Kenji

Ishikawa, Tetsuya

Yamauchi, Kazuto ^{[1
]}

机构：

[1] Osaka Univ, Grad Sch Engn, 2-1 Yamada Oka, Suita, Osaka 5650871, Japan

来源：

9TH INTERNATIONAL CONFERENCE ON X-RAY MICROSCOPY | 2009年 / 186卷

关键词：

LEVEL ACCURACY; FABRICATION;

D O I：

10.1088/1742-6596/186/1/012080

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

We have developed an advanced type of relative angle determinable stitching interferometry (RADSI) for hard x-ray nanofocusing mirrors. The surface metrology system consists of two types of optical interferometers. One is a microscope Michelson interferometer, which measures the local figure profile of the mirror surface, and the other is a large-area Fizeau interferometer, which determines the stitching angles between neighboring shots using a flat mirror. The surface figure profile of each of the one-shots and the stitching angles are measured at the same time. Precise measurement of local surface area and the stitching angles of 1 x 10(-8) rad order were achieved using the developed system. To demonstrate the accuracy of the developed measurement system, we measured an elliptically figured mirror for hard x-ray nanofocusing. The mirror's surface shape has a curvature radius of a few meters. As a result, measurement reproducibility and reliability of less than PV 3 nm was achieved by using a 25 urn focusing mirror.

引用

页数：3

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