Ferromagnetic/antiferromagnetic structures with ferromagnetic interlayer coupling

被引:2
|
作者
Edelstein, AS [1 ]
Kodama, RH
Miller, M
Browning, V
Lubitz, P
Sieber, H
机构
[1] USN, Res Lab, Washington, DC 20375 USA
[2] Univ Wisconsin, Dept Mat Sci & Engn, Madison, WI 53705 USA
关键词
D O I
10.1063/1.369903
中图分类号
O59 [应用物理学];
学科分类号
摘要
Multilayer samples and structures composed of NiO(t)/Co(2.5 nm)/NiO(t)/Py(2.5 nm)/NiO( t) with t = 6.6 and 13.2 nm exhibit ferromagnetic interlayer coupling below 400 K. A crossover is observed between the behavior near 300 K and at 10 K in ferromagnetic(F)/antiferromagnetic(AF) structures. Effects observed near 300 K, but not at 10 K, are an enhancement of Hc and the M-H loop squareness in F/AF multilayers as one increases the number of layers. A possible explanation for the crossover is given based on the domain wall thickness becoming less than the AF film thickness. (C) 1999 American Institute of Physics. [S0021-8979(99)67808-2].
引用
收藏
页码:5886 / 5888
页数:3
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