Anti-phase domains in cubic GaN

被引:31
作者
Kemper, Ricarda Maria [1 ]
Schupp, Thorsten [1 ]
Haeberlen, Maik [1 ]
Niendorf, Thomas [2 ]
Maier, Hans-Juergen [2 ]
Dempewolf, Anja [3 ]
Bertram, Frank [3 ]
Christen, Juergen [3 ]
Kirste, Ronny [4 ]
Hoffmann, Axel [4 ]
Lindner, Joerg [1 ]
As, Donat Josef [1 ]
机构
[1] Univ Paderborn, Dept Phys, D-33098 Paderborn, Germany
[2] Univ Paderborn, Lehrstuhl Werkstoffkunde, D-33098 Paderborn, Germany
[3] Univ Magdeburg, Inst Festkorperphys, D-39016 Magdeburg, Germany
[4] Tech Univ Berlin, Inst Solid State Phys, D-10623 Berlin, Germany
关键词
CHEMICAL-VAPOR-DEPOSITION; CATHODOLUMINESCENCE MICROSCOPY; RAMAN-SPECTROSCOPY; PERFORMANCE; EPILAYERS; SIC/SI; MBE;
D O I
10.1063/1.3666050
中图分类号
O59 [应用物理学];
学科分类号
摘要
The existence of anti-phase domains in cubic GaN grown on 3C-SiC/Si (001) substrates by plasma-assisted molecular beam epitaxy is reported. The influence of the 3C-SiC/Si (001) substrate morphology is studied with emphasis on the anti-phase domains (APDs). The GaN nucleation is governed by the APDs of the substrate, resulting in equal plane orientation and the same anti-phase boundaries. The presence of the APDs is independent of the GaN layer thickness. Atomic force microscopy surface analysis indicates lateral growth anisotropy of GaN facets in dependence of the APD orientation. This anisotropy can be linked to Ga and N face types of the {111} planes, similar to observations of anisotropic growth in 3C-SiC. In contrast to 3C-SiC, however, a difference in GaN phase composition for the two types of APDs can be measured by electron backscatter diffraction, mu-Raman and cathodoluminescence spectroscopy. (C) 2011 American Institute of Physics. [doi: 10.1063/1.3666050]
引用
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页数:5
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