Power-switching applications beyond silicon: Status and future prospects of SiC and GaN devices

被引:61
作者
Dimitrijev, Sima [1 ]
Han, Jisheng [1 ]
Moghadam, Hamid Amini [1 ,2 ]
Aminbeidokhti, Amirhossein [1 ,2 ]
机构
[1] Griffith Univ, Queensland Micro & Nanotechnol Ctr, Nathan, Qld 4111, Australia
[2] Griffith Univ, Griffith Sch Engn, Nathan, Qld 4111, Australia
关键词
PATTERNED SAPPHIRE; CHANNEL MOBILITY; ALGAN/GAN HEMT; ON-RESISTANCE; MOS-HEMT; VOLTAGE; MODE; PERFORMANCE; GROWTH;
D O I
10.1557/mrs.2015.89
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
This article reviews the development of SiC and GaN devices for power-switching applications in the context of four specifically identified application requirements: (1) high-blocking voltage, (2) high-power efficiency, (3) high-switching speed, and (4) normally OFF operation. Specific device and material characteristics, such as ON resistance, parasitic capacitances, and energy-gap values, are compared and discussed in relation to the identified application requirements. Following a review of the fundamental limitations of silicon as a material, this article describes the material advantages that motivated the development of commercially available Schottky diodes and transistors using SiC. The last section analyzes the potential of GaN to enable further technical progress beyond the theoretical limit of Si and to significantly reduce the cost of power-electronic switches.
引用
收藏
页码:399 / 405
页数:7
相关论文
共 47 条
[1]   Two-dimensional electron gases induced by spontaneous and piezoelectric polarization charges in N- and Ga-face AlGaN/GaN heterostructures [J].
Ambacher, O ;
Smart, J ;
Shealy, JR ;
Weimann, NG ;
Chu, K ;
Murphy, M ;
Schaff, WJ ;
Eastman, LF ;
Dimitrov, R ;
Wittmer, L ;
Stutzmann, M ;
Rieger, W ;
Hilsenbeck, J .
JOURNAL OF APPLIED PHYSICS, 1999, 85 (06) :3222-3233
[2]   Gallium nitride devices for power electronic applications [J].
Baliga, B. Jayant .
SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 2013, 28 (07)
[3]   POWER SEMICONDUCTOR-DEVICE FIGURE OF MERIT FOR HIGH-FREQUENCY APPLICATIONS [J].
BALIGA, BJ .
IEEE ELECTRON DEVICE LETTERS, 1989, 10 (10) :455-457
[4]   SiC versus Si-Evaluation of Potentials for Performance Improvement of Inverter and DC-DC Converter Systems by SiC Power Semiconductors [J].
Biela, Juergen ;
Schweizer, Mario ;
Waffler, Stefan ;
Kolar, Johann W. .
IEEE TRANSACTIONS ON INDUSTRIAL ELECTRONICS, 2011, 58 (07) :2872-2882
[5]   A Sub-Critical Barrier Thickness Normally-Off AlGaN/GaN MOS-HEMT [J].
Brown, Raphael ;
Macfarlane, Douglas ;
Al-Khalidi, Abdullah ;
Li, Xu ;
Ternent, Gary ;
Zhou, Haiping ;
Thayne, Iain ;
Wasige, Edward .
IEEE ELECTRON DEVICE LETTERS, 2014, 35 (09) :906-908
[6]   Control of threshold voltage of AlGaN/GaN HEMTs by fluoride-based plasma treatment: From depletion mode to enhancement mode [J].
Cai, Yong ;
Zhou, Yugang ;
Lau, Kei May ;
Chen, Kevin J. .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2006, 53 (09) :2207-2215
[7]   Dislocation structure of GaN films grown on planar and nano-patterned sapphire [J].
Cao, Wanjun ;
Biser, Jeffrey M. ;
Ee, Yik-Khoon ;
Li, Xiao-Hang ;
Tansu, Nelson ;
Chan, Helen M. ;
Vinci, Richard P. .
JOURNAL OF APPLIED PHYSICS, 2011, 110 (05)
[8]   Effects of Initial GaN Growth Mode on Patterned Sapphire on the Opto-Electrical Characteristics of GaN-Based Light-Emitting Diodes [J].
Chang, Hung-Ming ;
Lai, Wei-Chih ;
Chang, Shoou-Jinn .
JOURNAL OF DISPLAY TECHNOLOGY, 2013, 9 (04) :292-296
[9]   Enhancement-mode AlGaN/GaN HEMT and MIS-HEMT technology [J].
Chen, Kevin J. ;
Zhou, Chunhua .
PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 2011, 208 (02) :434-438
[10]   Strategic Overview of High-Voltage SiC Power Device Development Aiming at Global Energy Savings [J].
Cheng, Lin ;
Palmour, John W. ;
Agarwal, Anant K. ;
Allen, Scott T. ;
Brunt, Edward V. ;
Wang, Gangyao ;
Pala, Vipindas ;
Sung, Woongje ;
Huang, Alex Q. ;
O'Loughlin, Michael ;
Burk, Albert ;
Grider, Dave ;
Scozzie, Charles .
SILICON CARBIDE AND RELATED MATERIALS 2013, PTS 1 AND 2, 2014, 778-780 :1089-+