MAPPER: High throughput maskless lithography

被引：25

作者：

Wieland, M. J. ^{[1
]}

de Boer, G. ^{[1
]}

ten Berge, G. F. ^{[1
]}

van Kervinck, M. ^{[1
]}

Jager, R. ^{[1
]}

Peijster, J. J. M. ^{[1
]}

Slot, E. ^{[1
]}

Steenbrink, S. W. H. K. ^{[1
]}

Teepen, T. F. ^{[1
]}

Kampherbeek, B. J. ^{[1
]}

机构：

[1] MAPPER Lithog BV, NL-2628 XK Delft, Netherlands

来源：

ALTERNATIVE LITHOGRAPHIC TECHNOLOGIES II | 2010年 / 7637卷

关键词：

MAPPER; maskless; lithography; electron beam; EBDW; massively parallel;

D O I：

10.1117/12.849480

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

MAPPER Lithography is developing a maskless lithography technology based on massively-parallel electron-beam writing with high speed optical data transport for switching the electron beams. In this way optical columns can be made with a throughput of 10-20 wafers per hour. By clustering several of these systems together high throughputs can be realized in a small footprint. This enables a highly cost-competitive alternative to double patterning and EUV alternatives [1]. In 2009 MAPPER shipped two systems one to TSMC and one to CEA-Leti. Both systems will be used to verify the applicability of MAPPER's technology for CMOS manufacturing. This paper presents a status update on the development of the MAPPER system over the past year. First an overview will be presented how to scale the current system to a 10 wph machine which can consequently be used in a cluster configuration to enable 100 wph throughputs. Then the results of today's (pre-) alpha systems with 300 mm wafer capability are presented from the machines at MAPPER, TSMC and CEA-Leti.

引用

页数：10

共 6 条

[1]

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[2]

LIN SY, 2010, P SPIE ADV IN PRESS

[3] Mapper: High throughput maskless lithography [J].

Slot, E. ;

Wieland, M. J. ;

de Boer, G. ;

Kruit, P. ;

ten Berge, G. F. ;

Houkes, A. M. C. ;

Jager, R. ;

van de Peut, T. ;

Peijster, J. J. M. ;

Steenbrink, S. W. H. K. ;

Teepen, T. F. ;

van Veen, A. H. V. ;

Kampherbeek, B. J. .

EMERGING LITHOGRAPHIC TECHNOLOGIES XII, PTS 1 AND 2, 2008, 6921

[4]

STEENBRINK SWH, 2008, P SPIE, V6921

[5]

Wieland M.J., 2009, P SOC PHOTO-OPT INS, V7271

[6]

WIELAND MJ, 2010, P SPIE ADV IN PRESS

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