An experiment-based method for focused ion beam milling profile calculation and process design

被引:7
作者
Li, Yuan [1 ]
Xing, Yan [1 ]
Fang, Chen [1 ]
Chen, Qianhuang [1 ]
Qiu, Xiaoli [1 ]
机构
[1] Southeast Univ, Sch Mech Engn, Jiangsu Key Lab Design & Manufacture Micronano Bi, Nanjing, Jiangsu, Peoples R China
基金
中国国家自然科学基金;
关键词
Focused ion beam; Sputtering; Redeposition attenuation effect; Particle swarm optimization; Process parameter design and calibration; PARTICLE SWARM OPTIMIZATION; FABRICATION; REDEPOSITION; SIMULATION; MICROSTRUCTURES;
D O I
10.1016/j.sna.2018.12.033
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A new experiment-based method is presented to efficiently and accurately obtain the resulting outline of micro-structures from focused ion beam (FIB) milling and to guide the design of the process parameters for some specific structures. The approach uses separate distribution equations to solve the evolution distributions of the structural profile from sputtering and redeposition during the process. Through a series of basic experiments, the experimental equations of the key process parameters are set up to describe their influence on the contour of the machining results. By combining these equations with the distributions, the spread functions of etching and deposition are established. An expectation difference function (EDF) is considered between the spread functions to describe the increasing distance between the redeposition distribution center and the scanning beam center during processing, which is a main reason of the redeposition attenuation effect. The sum of the spread functions under the influence from EDF is the effect of superposition of sputtering and redeposition, and its response developing through the scanning strategy to the profile is calculated as the final result of the process. To reduce the deviations between the simulated and experimental results caused by variations from process conditions and device conditions, particle swarm optimization (PSO) is introduced to modify these model parameters. To stress the flexibility of the method, several different process conditions are tested, including the calculation of redeposition profile on quartz for the first time. As a further application, we also evaluate the ability of the method to help with the parameter design and modification for processing complex microstructures through FIB in practice. The good agreement between profile calculation and the experiment, and the good role in the process parameter design, fully demonstrate the application prospect of the method. (C) 2018 Elsevier B.V. All rights reserved.
引用
收藏
页码:78 / 90
页数:13
相关论文
共 37 条
[1]   Accurate focused ion beam sculpting of silicon using a variable pixel dwell time approach [J].
Adams, DP ;
Vasile, MJ .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2006, 24 (02) :836-844
[2]   Research on particle swarm optimization based clustering: A systematic review of literature and techniques [J].
Alam, Shafiq ;
Dobbie, Gillian ;
Koh, Yun Sing ;
Riddle, Patricia ;
Rehman, Saeed Ur .
SWARM AND EVOLUTIONARY COMPUTATION, 2014, 17 :1-13
[3]   Fabrication of conical micropore structure on silicon nitride/silicon using focused ion beam milling for biosensor application [J].
Ariffin, Nur Hamizah Zainal ;
Yahaya, Hafizal ;
Shinano, Shunji ;
Tanaka, Satoru ;
Hashim, Abdul Manaf .
MICROELECTRONIC ENGINEERING, 2015, 133 :1-5
[4]   Simulation of material sputtering with a focused ion beam [J].
Borgardt, N. I. ;
Volkov, R. L. ;
Rumyantsev, A. V. ;
Chaplygin, Yu. A. .
TECHNICAL PHYSICS LETTERS, 2015, 41 (06) :610-613
[5]   FIBSIM - dynamic Monte Carlo simulation of compositional and topography changes caused by focused ion beam milling [J].
Boxleitner, W ;
Hobler, G .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2001, 180 :125-129
[6]   Study and formation of 2D microstructures of sapphire by focused ion beam milling [J].
Dai, Tao ;
Kang, Xiangning ;
Zhang, Bei ;
Xu, Jun ;
Bao, Kui ;
Xiong, Chang ;
Gan, Zizhao .
MICROELECTRONIC ENGINEERING, 2008, 85 (03) :640-645
[7]   Redeposition during ion-beam erosion can stabilize well-ordered nanostructures [J].
Diddens, C. ;
Linz, S. J. .
EPL, 2013, 104 (01)
[8]   Continuum modeling of particle redeposition during ion-beam erosion Laterally two-dimensional case [J].
Diddens, Christian ;
Linz, Stefan J. .
EUROPEAN PHYSICAL JOURNAL B, 2015, 88 (07)
[9]   Modeling of precursor coverage in ion-beam induced etching and verification with experiments using XeF2 on SiO2 [J].
Ebm, Christoph ;
Hobler, Gerhard ;
Waid, Simon ;
Wanzenboeck, Heinz D. .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2010, 28 (05) :946-951
[10]   Fabrication of three-dimensional microstructures by two-dimensional slice by slice approaching via focused ion beam milling [J].
Fu, Y ;
Bryan, NKA .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2004, 22 (04) :1672-1678