Formation of low resistance nonalloyed Ti/Au ohmic contacts to n-type ZnO by KrF excimer laser irradiation

被引：18
|
作者：
Oh, MS [1 ]
Kim, SH [1 ]
Hwang, DK [1 ]
Park, SJ [1 ]
Seong, TY [1 ]
机构：
[1] Gwangju Inst Sci & Technol, Dept Mat Sci & Engn, Kwangju 500712, South Korea
来源：
ELECTROCHEMICAL AND SOLID STATE LETTERS | 2005年 / 8卷 / 11期
关键词：
D O I：
10.1149/1.2056447
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
We report on the formation of high-quality nonalloyed Ti (30 nm)/Au (50 nm) ohmic contacts to n-type ZnO: Al using laser irradiation treatment. The electrical characteristics of the Ti/Au contacts are considerably improved when laser-irradiated. The specific contact resistances are measured to be similar to 10(-4) Omega cm(2) when the ZnO layers were laser irradiated, which is about two orders of magnitude lower than that of the as-grown sample. Based on electrical and X-ray photoelectron spectroscopy results, a possible mechanism for the laser-irradiation-induced improvement is described. (c) 2005 The Electrochemical Society.
引用
收藏
页码：G317 / G319
页数：3
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