Intermetallic phase formation in electrochemical alloy deposition

被引:19
作者
Fujiwara, Y [1 ]
Enomoto, H [1 ]
机构
[1] Osaka Municipal Tech Res Inst, Joto Ku, Osaka 5368553, Japan
关键词
electrochemical deposition; intermetallic phases; site exchange; solid-state diffusion; underpotential deposition;
D O I
10.1007/s10008-003-0441-5
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
Three examples of the electrochemical deposition of intermetallic phases are shown. Electrodeposition of the single-phase beta'-brass superlattice at underpotentials of Zn in Cu-Zn alloy plating is explained by an accumulative underpotential deposition (UPD) mechanism. Growth of the Cu-Sn intermetallic phase layer in the contact immersion deposition of Sn onto Cu is accounted for by a UPD/vertical solid-state diffusion mechanism. Ag3Sn formation in the Sn/Ag-nanoparticle composite plating is illustrated by atomic site exchange at the interface between the deposited Sn matrix and the occluded Ag nanoparticles.
引用
收藏
页码:167 / 173
页数:7
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