Design consideration of emitter-base junction structure for InGaP/GaAs heterojunction bipolar transistors

被引:7
|
作者
Cheng, SY [1 ]
Chang, WL [1 ]
Pan, HJ [1 ]
Shie, YH [1 ]
Liu, WC [1 ]
机构
[1] Natl Cheng Kung Univ, Dept Elect Engn, Tainan 70101, Taiwan
关键词
D O I
10.1016/S0038-1101(98)00268-8
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this paper, the different designs of emitter-base junction including the employment of the delta-doping sheet and setback layer are presented and studied. A theoretical model is used to analyze the performances of the proposed different InGaP/GaAs heterojunction bipolar transistors (HBTs). Experimentally, a new InGaP/GaAs HBT with a delta-doping sheet and a setback layer inserting between emitter-base heterointerface is fabricated successfully. From the theoretical analysis and experimental results, it is found that the insertion of the delta-doping sheet and the setback layer can effectively eliminate the undesired potential spike at N-InGaP/p(+)-GaAs heterointerface. The experimental common-emitter current gain of 280 at collector current of 85 mA and a low offset voltage of 55 mV are achieved. In addition, a current gain of 11 at very small collector current of 0.5 mu A without passivation is obtained. (C) 1998 Elsevier Science Ltd. All rights reserved.
引用
收藏
页码:297 / 304
页数:8
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