Triple point behavior of Ar and N2 in mesopores

被引：11

作者：

Hofmann, T ^{[1
]}

Wallacher, D ^{[1
]}

Huber, P ^{[1
]}

Knorr, K ^{[1
]}

机构：

[1] Univ Saarland, D-66041 Saarbrucken, Germany

来源：

JOURNAL OF LOW TEMPERATURE PHYSICS | 2005年 / 140卷 / 1-2期

关键词：

adsorption; desorption; isotherm; argon; nitrogen; mesoporous silicon; triple point; phase diagram; X-ray diffraction;

D O I：

10.1007/s10909-005-6014-5

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Vapour pressure isotherms and X-ray diffraction patterns have been measured for Ar and N-2 condensed into mesoporous Si. The chemical potential-temperature phase diagram has been established in the triple point region.

引用

页码：91 / 103

页数：13

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