Isomorphic contact resonance force microscopy and piezoresponse force microscopy of an AlN thin film: demonstration of a new contact resonance technique
被引:2
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作者:
Robins, Lawrence H.
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机构:
NIST, Appl Chem & Mat Div, Boulder, CO 80309 USANIST, Appl Chem & Mat Div, Boulder, CO 80309 USA
Robins, Lawrence H.
[1
]
Brubaker, Matt D.
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NIST, Div Appl Phys, Boulder, CO USANIST, Appl Chem & Mat Div, Boulder, CO 80309 USA
Brubaker, Matt D.
[2
]
Tung, Ryan C.
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机构:
Univ Nevada Reno, Dept Mech Engn, Reno, NV USANIST, Appl Chem & Mat Div, Boulder, CO 80309 USA
Tung, Ryan C.
[3
]
Killgore, Jason P.
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机构:
NIST, Appl Chem & Mat Div, Boulder, CO 80309 USANIST, Appl Chem & Mat Div, Boulder, CO 80309 USA
Killgore, Jason P.
[1
]
机构:
[1] NIST, Appl Chem & Mat Div, Boulder, CO 80309 USA
[2] NIST, Div Appl Phys, Boulder, CO USA
[3] Univ Nevada Reno, Dept Mech Engn, Reno, NV USA
atomic force microscopy;
contact resonance force microscopy;
piezoresponse force microscopy;
piezoelectric thin film;
electromechanical properties;
CALIBRATION;
D O I:
10.1088/2399-1984/ab844f
中图分类号:
TB3 [工程材料学];
学科分类号:
0805 ;
080502 ;
摘要:
We present a new contact resonance force microscopy (CRFM) imaging technique, isomorphic contact resonance (iso-CR), that acquires data at a constant contact resonance (CR) frequency, and hence constant tip-sample contact stiffness across the scan area. Constant CR frequency is obtained by performing force versus distance measurements to vary the applied force at each pixel (i.e. force-volume mapping mode). The CR frequency increases with increasing applied force; thus, a carefully selected target frequency will be reached for most pixels at some point in the force versus distance curve. In the iso-CR mode, the cantilever maintains an invariant vibrational shape and a constant environmental damping, thus simplifying interpretation of amplitude and quality factor contrast compared to conventional CRFM. Iso-CR imaging of a piezoelectric AlN thin film sample is demonstrated. Iso-CRFM images were obtained by mechanically driving the base of the cantilever, and iso-CR piezoresponse force microscopy (iso-CR-PFM) images were obtained by electrically biasing the tip. The PFM phase images reveal that the sample contains nanoscale Al-polar (or 'up') and N-polar (or 'down') domains, with approximate to 180 degrees phase contrast between oppositely polarized domains. The PFM amplitude and Q-factor images also show 'up' vs. 'down' domain contrast, which decreases with increasing CR frequency. The frequency-dependent amplitude and Q contrast is ascribed to a frequency-dependent electrostatic contribution to the signal. Domain contrast is not observed in the CRFM (mechanically driven) images. To summarize, the iso-CR capability to control the resonance frequency across multiple excitation schemes helps elucidate the origin of the electromechanical and nanomechanical image contrast.
机构:
Department of Engineering Mechanics, University of Nebraska-Lincoln, W317.4 Nebraska Hall, Lincoln, NE 68588-0526, United StatesDepartment of Engineering Mechanics, University of Nebraska-Lincoln, W317.4 Nebraska Hall, Lincoln, NE 68588-0526, United States
Yuya, P.A.
Hurley, D.C.
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机构:
Materials Reliability Division, National Institute of Standards and Technology, Boulder, CO 80305, United StatesDepartment of Engineering Mechanics, University of Nebraska-Lincoln, W317.4 Nebraska Hall, Lincoln, NE 68588-0526, United States
Hurley, D.C.
Turner, J.A.
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机构:
Department of Engineering Mechanics, University of Nebraska-Lincoln, W317.4 Nebraska Hall, Lincoln, NE 68588-0526, United StatesDepartment of Engineering Mechanics, University of Nebraska-Lincoln, W317.4 Nebraska Hall, Lincoln, NE 68588-0526, United States
机构:
Virginia Polytech Inst & State Univ, Dept Engn Sci & Mech, Blacksburg, VA 24061 USAVirginia Polytech Inst & State Univ, Dept Engn Sci & Mech, Blacksburg, VA 24061 USA
Abdel-Rahman, EM
Nayfeh, AH
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Virginia Polytech Inst & State Univ, Dept Engn Sci & Mech, Blacksburg, VA 24061 USAVirginia Polytech Inst & State Univ, Dept Engn Sci & Mech, Blacksburg, VA 24061 USA