Electrochemical deposition of a copper carboxylate layer on copper as potential corrosion inhibitor

被引:17
|
作者
Elia, Alice [1 ]
De Wael, Karolien [1 ]
Dowsett, Mark [2 ]
Adriaens, Annemie [1 ]
机构
[1] State Ghent Univ, Dept Analyt Chem, B-9000 Ghent, Belgium
[2] Univ Warwick, Dept Phys, Coventry CV4 7AL, W Midlands, England
关键词
Copper carboxylates; Cyclic voltammetry; Corrosion inhibition; Infrared spectroscopy; Cultural heritage; AQUEOUS CORROSION; LEAD; HEPTANOATE;
D O I
10.1007/s10008-010-1283-6
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
Carboxylic acids and sodium carboxylates are used to protect metals against aqueous and atmospheric corrosion. In this paper, we describe the application of a layer of copper carboxylate on the surface of a copper electrode by means of cyclic voltammetry technique and tests which measure the corresponding resistance to aqueous corrosion. Unlike the soaking process, which also forms a film on the surface, the use of cyclic voltammetry allows one to follow the deposition process of the copper carboxylates onto the electrode. The modified electrodes have been characterised with infrared spectroscopy. In addition, the corrosion resistance of the film has been investigated using polarisation resistance and Tafel plot measurements.
引用
收藏
页码:143 / 148
页数:6
相关论文
共 50 条
  • [1] Electrochemical deposition of a copper carboxylate layer on copper as potential corrosion inhibitor
    Alice Elia
    Karolien De Wael
    Mark Dowsett
    Annemie Adriaens
    Journal of Solid State Electrochemistry, 2012, 16 : 143 - 148
  • [2] Atomic layer deposition of copper and copper silver films using an electrochemical process
    Fang, J. S.
    Liu, Y. S.
    Chin, T. S.
    THIN SOLID FILMS, 2015, 580 : 1 - 5
  • [3] Ammonium dodecyl sulfate as a potential corrosion inhibitor surfactant for electrochemical mechanical planarization of copper
    Hong, Y
    Roy, D
    Babu, SV
    ELECTROCHEMICAL AND SOLID STATE LETTERS, 2005, 8 (11) : G297 - G300
  • [4] Electrochemical atomic layer deposition of copper nanofilms on ruthenium
    Gebregziabiher, Daniel K.
    Kim, Youn-Geun
    Thambidurai, Chandru
    Ivanova, Valentina
    Haumesser, Paul-Henri
    Stickney, John L.
    JOURNAL OF CRYSTAL GROWTH, 2010, 312 (08) : 1271 - 1276
  • [5] Electrochemical Investigation of Thiourea as Corrosion Inhibitor for Copper in Acidic Solution
    Wu, Jintian
    Wang, Lingling
    Liu, Peidong
    Liu, Yuanjie
    Chen, Bei
    Tao, Zhihua
    He, Wei
    ADVANCES IN ENERGY SCIENCE AND ENVIRONMENT ENGINEERING, 2017, 1829
  • [6] Electrochemical investigation of Cyproconazole as corrosion inhibitor for copper in synthetic seawater
    Liu, Ji
    Zheng, Li
    Gan, HaiBo
    Liu, Huan
    Tao, ZhiHua
    He, Wei
    ADVANCED MATERIALS RESEARCHES AND APPLICATION, 2013, 763 : 23 - 27
  • [7] Sulfathiazole as potential corrosion inhibitor for copper in 0.1 M NaCl
    Sibel Zor
    Protection of Metals and Physical Chemistry of Surfaces, 2014, 50 : 530 - 537
  • [8] Sulfathiazole as potential corrosion inhibitor for copper in 0.1 M NaCl
    Zor, Sibel
    PROTECTION OF METALS AND PHYSICAL CHEMISTRY OF SURFACES, 2014, 50 (04) : 530 - 537
  • [9] Electrophoretic deposition of graphene coating as a corrosion inhibitor for copper in NaCl solution
    Bo, Le
    Liu, Xinli
    Wang, Dezhi
    RESULTS IN SURFACES AND INTERFACES, 2022, 8
  • [10] BENZOTRIAZOLE AS CORROSION INHIBITOR FOR COPPER
    MANSFELD, F
    SMITH, T
    PARRY, EP
    CORROSION, 1971, 27 (07) : 289 - &