Using deep eutectic solvents to electrodeposit CoSm films and nanowires

被引：65

作者：

Cojocaru, P. ^{[3
]}

Magagnin, L. ^{[3
]}

Gomez, E. ^{[1
,2
]}

Valles, E. ^{[1
,2
]}

机构：

[1] Univ Barcelona, Dept Quim Fis, E-08028 Barcelona, Spain

[2] Univ Barcelona, Inst Nanociencia & Nanotecnol IN2UB, E-08028 Barcelona, Spain

[3] Politecn Milan, Dipartimento Chim Mat & Ingn Chim Giulio Natta, I-20131 Milan, Italy

来源：

MATERIALS LETTERS | 2011年 / 65卷 / 23-24期

关键词：

Electrodeposition; Ionic liquids; Rare earth alloys; Nanostructured materials; SMCO;

D O I：

10.1016/j.matlet.2011.08.003

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

A Deep Eutectic Solvent of 1 chlorine chloride: 2 urea eutectic mixture at 70 degrees C has been tested as useful to electrodeposit both magnetic SmCo films and nanowires. Galvanostatic deposition allows obtaining homogeneous deposits over metallic substrate with variable composition as a function of the current density applied. The deposits obtained at 0.5-1.5 mA cm(-2) were uniform and they correspond to a cobalt hexagonal crystalline phase with magnetic anisotropy and coercivity of 250 Oe. It has been possible to deposit SmCo nanowires from the DES solvent using alumina templates. Uniform CoSm nanowires of 50 nm of diameter have been obtained; they correspond also to hexagonal phase, but they present higher coercivity. (C) 2011 Elsevier B.V. All rights reserved.

引用

页码：3597 / 3600

页数：4

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