共 49 条
- [42] HIGH MOBILITY POLY-SI THIN-FILM TRANSISTORS USING SOLID-PHASE CRYSTALLIZED A-SI FILMS DEPOSITED BY PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITION JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1990, 29 (12): : L2380 - L2383
- [44] Structural and optical properties of a-Si:H/nc-Si:H thin films grown from Ar-H2-SiH4 mixture by plasma-enhanced chemical vapor deposition MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 2003, 104 (1-2): : 80 - 87
- [46] Plasma-enhanced atomic layer-deposited La2O3 ultra-thin films on Si and 6H-SiC: a comparative study APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2020, 126 (08):
- [47] Plasma-enhanced atomic layer-deposited La2O3 ultra-thin films on Si and 6H–SiC: a comparative study Applied Physics A, 2020, 126
- [48] Plasma-enhanced chemical vapor deposition growth of fluorinated amorphous carbon thin films using C4F8 and Si2H6/He for low-dielectric-constant intermetallic-layer dielectrics JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2005, 44 (7A): : 4886 - 4890