Application of scanning probe methods for electronic and magnetic device fabrication, characterization, and testing

被引：8

作者：

Born, A

Hahn, C

Lohndorf, M

Wadas, A

Witt, C

Wiesendanger, R

机构：

[1] UNIV HAMBURG,INST PHYS APPL,D-20355 HAMBURG,GERMANY

[2] UNIV HAMBURG,CTR MICROSTRUCT RES,D-20355 HAMBURG,GERMANY

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1996年 / 14卷 / 06期

关键词：

D O I：

10.1116/1.588738

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Selected examples of the application of scanning probe methods for the fabrication, characterization, and testing of electronic and magnetic devices are presented. In particular, promising combinations of conventional photolithography or e-beam lithography with scanning probe methods are described. The combination of atomic-scale self-organization processes with scanning probe microscopy and manipulation experiments possibly can lead to a novel class of atomic-scale devices which could be fabricated on a reasonable time scale. (C) 1996 American Vacuum Society.

引用

页码：3625 / 3631

页数：7