The effect of the pH value on the growth and properties of chemical bath deposited SnS thin films

被引：0

作者：

Kassim, Anuar ^{[1
]}

Min, Ho Soon ^{[1
]}

Shariff, Atan ^{[1
]}

Haron, Md Jelas ^{[1
]}

机构：

[1] Univ Putra Malaysia, Fac Sci, Dept Chem, Serdang 43400, Selangor, Malaysia

来源：

RESEARCH JOURNAL OF CHEMISTRY AND ENVIRONMENT | 2011年 / 15卷 / 03期

关键词：

Chemical bath deposition; thin films; tin sulphide; atomic force microscopy; film thickness; ELECTRODEPOSITION; SULFIDE; LAYER; EDTA;

D O I：

暂无

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Thin films of semiconductors were commonly used for the fabrication of inexpensive solar cells. The aim of the present study was to investigate the influence of pH (pH 1.5, 2.5 and 3.5) on the properties of chemical bath deposited SnS thin films. The differences in the morphological properties of the films were investigated using atomic force microscopy, meanwhile the optical properties were studied using UV-Visible spectrophotometer. We observed that the grain size was relatively uniform, good coverage and thicker films could be obtained at lower pH value such as pH 1.5. The band gap values were found to be 1.2-1.6 eV for the films deposited under various pH values.

引用

页码：45 / 48

页数：4

共 20 条

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