共 23 条
- [4] Bakshi V., 2006, EUV Sources for Lithography
- [7] Source for extreme ultraviolet lithography based on plasma sustained by millimeter-wave gyrotron radiation [J]. JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2012, 11 (02):
- [9] Fomenkov I, 2017, ADV OPT TECHNOL, V6, P173, DOI 10.1515/aot-2017-0029