Improvement in light-output efficiency of near-ultraviolet InGaN-GaN LEDs fabricated on stripe patterned sapphire substrates

被引:63
作者
Lee, YJ
Hsu, TC
Kuo, HC
Wang, SC
Yang, YL
Yen, SN
Chu, YT
Shen, YJ
Hsieh, MH
Jou, MJ
Lee, BJ
机构
[1] Natl Chiao Tung Univ, Dept Photon, Hsinchu 300, Taiwan
[2] Natl Chiao Tung Univ, Inst Electroopt Engn, Hsinchu 300, Taiwan
[3] Epistar Co Ltd, R&D Div, Hsinchu 300, Taiwan
来源
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY | 2005年 / 122卷 / 03期
关键词
GaN; InGaN; patterned sapphire substrate (PSS);
D O I
10.1016/j.mseb.2005.05.019
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
InGaN/GaN multi-quantum wells near ultraviolet light-emitting diodes (LEDs) were fabricated on a patterned sapphire substrate (PSS) with parallel stripe along the (1100)(sapphire) direction by using low-pressure metal-organic chemical vapor deposition (MOCVD). The forward- and reverse-bias electrical characteristics of the stripe PSS LEDs are, respectively, similar and better than those of conventional LEDs on sapphire substrate. The output power of the epoxy package of stripe PSS LED was 20% higher than that of the conventional LEDs. The enhancement of output power is due not only to the reduction of dislocation density but also to the release of the guided light in LEDs by the geometric shape of the stripe PSS, according to the ray-tracing analysis. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码:184 / 187
页数:4
相关论文
共 16 条
[1]   Heteroepitaxial lateral overgrowth of GaN on periodically grooved substrates: A new approach for growing low-dislocation-density GaN single crystals [J].
Detchprohm, T ;
Yano, M ;
Sano, S ;
Nakamura, R ;
Mochiduki, S ;
Nakamura, T ;
Amano, H ;
Akasaki, I .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 2001, 40 (1AB) :L16-L19
[2]   Lateral epitaxial patterned sapphire InGaN/GaN MQW LEDs [J].
Hsu, YP ;
Chang, SJ ;
Su, YK ;
Sheu, JK ;
Lee, CT ;
Wen, TC ;
Wu, LW ;
Kuo, CH ;
Chang, CS ;
Shei, SC .
JOURNAL OF CRYSTAL GROWTH, 2004, 261 (04) :466-470
[3]   Light-output enhancement in a nitride-based light-emitting diode with 22° undercut sidewalls [J].
Kao, CC ;
Kuo, HC ;
Huang, HW ;
Chu, JT ;
Peng, YC ;
Hsieh, YL ;
Luo, CY ;
Wang, SC ;
Yu, CC ;
Lin, CF .
IEEE PHOTONICS TECHNOLOGY LETTERS, 2005, 17 (01) :19-21
[4]   High-power truncated-inverted-pyramid (AlxGa1-x)0.5In0.5P/GaP light-emitting diodes exhibiting >50% external quantum efficiency [J].
Krames, MR ;
Ochiai-Holcomb, M ;
Höfler, GE ;
Carter-Coman, C ;
Chen, EI ;
Tan, IH ;
Grillot, P ;
Gardner, NF ;
Chui, HC ;
Huang, JW ;
Stockman, SA ;
Kish, FA ;
Craford, MG ;
Tan, TS ;
Kocot, CP ;
Hueschen, M ;
Posselt, J ;
Loh, B ;
Sasser, G ;
Collins, D .
APPLIED PHYSICS LETTERS, 1999, 75 (16) :2365-2367
[5]   High-brightness AlGaInP light-emitting diodes using surface texturing [J].
Linder, N ;
Kugler, S ;
Stauss, P ;
Streubel, KP ;
Wirth, R ;
Zull, H .
LIGHT-EMITTING DIODES: RESEARCH MANUFACTURING, AND APPLICATIONS V, 2001, 4278 :19-25
[6]  
MITSUO F, 1991, RELIABILITY DEGRADAT
[7]   LARGE-BAND-GAP SIC, III-V NITRIDE, AND II-VI ZNSE-BASED SEMICONDUCTOR-DEVICE TECHNOLOGIES [J].
MORKOC, H ;
STRITE, S ;
GAO, GB ;
LIN, ME ;
SVERDLOV, B ;
BURNS, M .
JOURNAL OF APPLIED PHYSICS, 1994, 76 (03) :1363-1398
[8]  
MUKAI T, 1995, JPN J APPL PHYS, V37, pL1358
[9]   HIGH-BRIGHTNESS INGAN BLUE, GREEN AND YELLOW LIGHT-EMITTING-DIODES WITH QUANTUM-WELL STRUCTURES [J].
NAKAMURA, S ;
SENOH, N ;
IWASA, N ;
NAGAHAMA, SI .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1995, 34 (7A) :L797-L799
[10]  
Nakamura S., 1997, BLUE LASER DIODE GAN