Heusler compounds are a tuneable class of material with a cubic crystal structure that can serve as a platform to study the topological phase of a material. These materials have numerous technological and scientific applications. So, in the present work, the mechanical, thermodynamical, and thermoelectric properties of LaAuPb in the topological phase have been reported by using density functional theory and Boltzmann transport theory. LaAuPb is mechanically stable, and the Poisson ratio reveals its ductile nature. The specific heat of the proposed compound at room temperature is 73.94 J K-1 mol(-1) at constant volume. Debye's temperature is estimated to be 188.64 K. Moreover, the lattice thermal conductivity of the compound is 14.64 W mK(-1) and 3.66 W mK(-1) at 300 K and 1200 K, respectively. The good thermoelectric response of LaAuPb can be confirmed by its high value of the figure of merit (0.46) at 1200 K. Hence, it is a potential material for thermoelectric applications. This work will help future researchers to better understand the stability, nature, and behavior of LaAuPb in material fabrication.
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ABV Indian Inst Informat Technol & Management, Adv Mat Res Lab, Gwalior 474010, IndiaABV Indian Inst Informat Technol & Management, Adv Mat Res Lab, Gwalior 474010, India
Srivastava, Anurag
Jain, Arpit
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ABV Indian Inst Informat Technol & Management, Adv Mat Res Lab, Gwalior 474010, India
MANIT, Dept Phys, Bhopal 462051, IndiaABV Indian Inst Informat Technol & Management, Adv Mat Res Lab, Gwalior 474010, India
Jain, Arpit
Kurchania, Rajnish
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MANIT, Dept Phys, Bhopal 462051, IndiaABV Indian Inst Informat Technol & Management, Adv Mat Res Lab, Gwalior 474010, India
Kurchania, Rajnish
Tyagi, Neha
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ABV Indian Inst Informat Technol & Management, Adv Mat Res Lab, Gwalior 474010, IndiaABV Indian Inst Informat Technol & Management, Adv Mat Res Lab, Gwalior 474010, India
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Univ Mascara, Fac Sci, Lab Phys Quant Matiere & Modelisat Math LPQ3M, Mascara 29000, AlgeriaUniv Mascara, Fac Sci, Lab Phys Quant Matiere & Modelisat Math LPQ3M, Mascara 29000, Algeria
Semari, F.
Boulechfar, R.
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Univ 20 Aout 1955, Fac Technol, Dept Technol, Skikda, Algeria
Fac Sci Annaba, Dept Phys, Lab LPR, Annaba, AlgeriaUniv Mascara, Fac Sci, Lab Phys Quant Matiere & Modelisat Math LPQ3M, Mascara 29000, Algeria
Boulechfar, R.
Dahmane, F.
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Univ Mascara, Fac Sci, Lab Phys Quant Matiere & Modelisat Math LPQ3M, Mascara 29000, AlgeriaUniv Mascara, Fac Sci, Lab Phys Quant Matiere & Modelisat Math LPQ3M, Mascara 29000, Algeria
Dahmane, F.
Abdiche, A.
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Univ Mascara, Fac Sci, Lab Phys Quant Matiere & Modelisat Math LPQ3M, Mascara 29000, AlgeriaUniv Mascara, Fac Sci, Lab Phys Quant Matiere & Modelisat Math LPQ3M, Mascara 29000, Algeria
Abdiche, A.
Ahmed, R.
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Univ Punjab, Ctr High Energy Phys, Quaid e Azam Campus, Lahore 54590, Pakistan
Univ Teknol Malaysia, Fac Sci, Dept Phys, Johor Baharu 81310, Johor, MalaysiaUniv Mascara, Fac Sci, Lab Phys Quant Matiere & Modelisat Math LPQ3M, Mascara 29000, Algeria
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Univ Ferhat Abbas Setif 1, Lab Developing New Mat & Their Characterizat, Setif 19000, AlgeriaUniv Mascara, Fac Sci, Lab Phys Quant Matiere & Modelisat Math LPQ3M, Mascara 29000, Algeria
Bouhemadou, A.
Khenata, R.
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Univ Mascara, Fac Sci, Lab Phys Quant Matiere & Modelisat Math LPQ3M, Mascara 29000, AlgeriaUniv Mascara, Fac Sci, Lab Phys Quant Matiere & Modelisat Math LPQ3M, Mascara 29000, Algeria
Khenata, R.
Wang, X. T.
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Southwest Univ, Sch Phys Sci & Technol, Chongqing 400715, Peoples R ChinaUniv Mascara, Fac Sci, Lab Phys Quant Matiere & Modelisat Math LPQ3M, Mascara 29000, Algeria
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ABV Indian Inst Informat Technol & Management, Adv Mat Res Lab, Gwalior 474010, IndiaABV Indian Inst Informat Technol & Management, Adv Mat Res Lab, Gwalior 474010, India
Srivastava, Anurag
Jain, Arpit
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ABV Indian Inst Informat Technol & Management, Adv Mat Res Lab, Gwalior 474010, India
MANIT, Dept Phys, Bhopal 462051, IndiaABV Indian Inst Informat Technol & Management, Adv Mat Res Lab, Gwalior 474010, India
Jain, Arpit
Kurchania, Rajnish
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MANIT, Dept Phys, Bhopal 462051, IndiaABV Indian Inst Informat Technol & Management, Adv Mat Res Lab, Gwalior 474010, India
Kurchania, Rajnish
Tyagi, Neha
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ABV Indian Inst Informat Technol & Management, Adv Mat Res Lab, Gwalior 474010, IndiaABV Indian Inst Informat Technol & Management, Adv Mat Res Lab, Gwalior 474010, India
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Univ Mascara, Fac Sci, Lab Phys Quant Matiere & Modelisat Math LPQ3M, Mascara 29000, AlgeriaUniv Mascara, Fac Sci, Lab Phys Quant Matiere & Modelisat Math LPQ3M, Mascara 29000, Algeria
Semari, F.
Boulechfar, R.
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h-index: 0
机构:
Univ 20 Aout 1955, Fac Technol, Dept Technol, Skikda, Algeria
Fac Sci Annaba, Dept Phys, Lab LPR, Annaba, AlgeriaUniv Mascara, Fac Sci, Lab Phys Quant Matiere & Modelisat Math LPQ3M, Mascara 29000, Algeria
Boulechfar, R.
Dahmane, F.
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机构:
Univ Mascara, Fac Sci, Lab Phys Quant Matiere & Modelisat Math LPQ3M, Mascara 29000, AlgeriaUniv Mascara, Fac Sci, Lab Phys Quant Matiere & Modelisat Math LPQ3M, Mascara 29000, Algeria
Dahmane, F.
Abdiche, A.
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h-index: 0
机构:
Univ Mascara, Fac Sci, Lab Phys Quant Matiere & Modelisat Math LPQ3M, Mascara 29000, AlgeriaUniv Mascara, Fac Sci, Lab Phys Quant Matiere & Modelisat Math LPQ3M, Mascara 29000, Algeria
Abdiche, A.
Ahmed, R.
论文数: 0引用数: 0
h-index: 0
机构:
Univ Punjab, Ctr High Energy Phys, Quaid e Azam Campus, Lahore 54590, Pakistan
Univ Teknol Malaysia, Fac Sci, Dept Phys, Johor Baharu 81310, Johor, MalaysiaUniv Mascara, Fac Sci, Lab Phys Quant Matiere & Modelisat Math LPQ3M, Mascara 29000, Algeria
机构:
Univ Ferhat Abbas Setif 1, Lab Developing New Mat & Their Characterizat, Setif 19000, AlgeriaUniv Mascara, Fac Sci, Lab Phys Quant Matiere & Modelisat Math LPQ3M, Mascara 29000, Algeria
Bouhemadou, A.
Khenata, R.
论文数: 0引用数: 0
h-index: 0
机构:
Univ Mascara, Fac Sci, Lab Phys Quant Matiere & Modelisat Math LPQ3M, Mascara 29000, AlgeriaUniv Mascara, Fac Sci, Lab Phys Quant Matiere & Modelisat Math LPQ3M, Mascara 29000, Algeria
Khenata, R.
Wang, X. T.
论文数: 0引用数: 0
h-index: 0
机构:
Southwest Univ, Sch Phys Sci & Technol, Chongqing 400715, Peoples R ChinaUniv Mascara, Fac Sci, Lab Phys Quant Matiere & Modelisat Math LPQ3M, Mascara 29000, Algeria