Layer-dependent band to band tunneling in WSe2/ReS2van der Waals heterojunction

被引:3
|
作者
Ou, Yang [1 ,2 ]
Liu, Baishan [1 ,2 ]
Kang, Zhuo [1 ,2 ]
Liao, Qingliang [1 ,2 ]
Zhang, Zheng [1 ,2 ]
Zhang, Yue [1 ,2 ]
机构
[1] Univ Sci & Technol Beijing, Beijing Adv Innovat Ctr Mat Genome Engn, Beijing Key Lab Adv Energy Mat & Technol, Beijing 100083, Peoples R China
[2] Univ Sci & Technol Beijing, Sch Mat Sci & Engn, State Key Lab Adv Met & Mat, Beijing 100083, Peoples R China
基金
中国国家自然科学基金;
关键词
van der Waals heterojunction; tunneling field-effect transistors; band to band tunneling; direct-indirect band gap transition; TRANSITION-METAL DICHALCOGENIDES; ELECTRONIC-PROPERTIES; HETEROSTRUCTURES; GRAPHENE; MOS2; TRANSISTORS; MONOLAYER; GROWTH;
D O I
10.1088/1361-6463/ab8f52
中图分类号
O59 [应用物理学];
学科分类号
摘要
Van der Waals (vdW) heterostructures are promising for building tunneling field-effect transistors (TFETs), owing to an inherent narrow vdW gap between two stacked materials induced by the dangling bond free surface. However, the band to band tunneling (BTBT) of such a vdW heterostructure TFET strongly depends on the layer-dependent band structure variation at the interface. Here, we report a first principle simulation on the BTBT transition of the monolayer ReS(2)based heterostructures with monolayer and bilayer WSe2. An obvious decrease of the turn-on gate voltage from 36 V to 12 V was achieved by adding a layer of WSe(2)due to the band gap narrowing and momentum conservative Gamma-Gamma tunneling. Under the gate voltage of 20 V with bias of 0.271 V, the upper limit of the BTBT saturate current density in bilayer WSe(2)vdW heterojunction can reach 934 mu A mu m(-1). These results show the bilayer WSe(2)heterojunction could be an ideal candidate for lower power and high operating speed TFETs.
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页数:8
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