Control of thin film structure by reactant pressure in atomic layer deposition of TiO2

被引：73

作者：

Aarik, J

Aidla, A

Sammelselg, V

Siimon, H

Uustare, T

机构：

[1] TARTU STATE UNIV,INST EXPT PHYS & TECHOL,EE-2400 TARTU,ESTONIA

[2] ESTONIAN ACAD SCI,INST PHYS,EE-2400 TARTU,ESTONIA

来源：

JOURNAL OF CRYSTAL GROWTH | 1996年 / 169卷 / 03期

关键词：

D O I：

10.1016/S0022-0248(96)00423-X

中图分类号：

O7 [晶体学];

学科分类号：

0702 ; 070205 ; 0703 ; 080501 ;

摘要：

Atomic layer growth of TiO2 films from TiCl4 and H2O was examined. It was established that polycrystalline films of pure rutile, pure TiO2-II, or a mixture of them could be obtained at the same growth temperature (400 degrees C) and at the same TiCl4 vapor pressure (0.34 Pa) applying different water vapor pressures during the water pulse. Possible growth mechanisms leading to formation of different structures are discussed.

引用

收藏

页码：496 / 502

页数：7

相关论文

共 27 条

[1] Atomic-layer growth of TiO2-II thin films [J].

Aarik, J ;

Aidla, A ;

Uustare, T .

PHILOSOPHICAL MAGAZINE LETTERS, 1996, 73 (03) :115-119

[2] MORPHOLOGY AND STRUCTURE OF TIO2 THIN-FILMS GROWN BY ATOMIC LAYER DEPOSITION [J].

AARIK, J ;

AIDLA, A ;

UUSTARE, T ;

SAMMELSELG, V .

JOURNAL OF CRYSTAL GROWTH, 1995, 148 (03) :268-275

[3] IN-SITU STUDY OF A STRONTIUM BETA-DIKETONATE PRECURSOR FOR THIN-FILM GROWTH BY ATOMIC LAYER EPITAXY [J].

AARIK, J ;

AIDLA, A ;

JAEK, A ;

LESKELA, M ;

NIINISTO, L .

JOURNAL OF MATERIALS CHEMISTRY, 1994, 4 (08) :1239-1244

[4] POLYMORPHIC TRANSFORMATIONS OF TITANIA INDUCED BY BALL-MILLING [J].

BEGINCOLIN, S ;

LECAER, G ;

MOCELLIN, A ;

ZANDONA, M .

PHILOSOPHICAL MAGAZINE LETTERS, 1994, 69 (01) :1-7

[5]

Bendeliany N.A., 1966, GEOCHEMISTRY-USSR, V5, P499

[6] USE OF ISOTOPIC LABELING IN A SIMS STUDY OF THE HYDROXYLATION OF TIO2(100) SURFACES [J].

BOURGEOIS, S ;

JOMARD, F ;

PERDEREAU, M .

SURFACE SCIENCE, 1992, 279 (03) :349-354

[7] ULTRAHIGH-VACUUM METALORGANIC CHEMICAL-VAPOR-DEPOSITION GROWTH AND IN-SITU CHARACTERIZATION OF EPITAXIAL TIO2 FILMS [J].

CHEN, S ;

MASON, MG ;

GYSLING, HJ ;

PAZPUJALT, GR ;

BLANTON, TN ;

CASTRO, T ;

CHEN, KM ;

FICTORIE, CP ;

GLADFELTER, WL ;

FRANCIOSI, A ;

COHEN, PI ;

EVANS, JF .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1993, 11 (05) :2419-2429

[8] ULTRA-THIN TIO2 FILMS BY A NOVEL METHOD [J].

DESU, SB .

MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 1992, 13 (04) :299-303

[9] TIO2 .2. AMBIENT PRESSURE PREPARATION AND STRUCTURE REFINEMENT [J].

GREY, IE ;

LI, C ;

MADSEN, IC ;

BRAUNSHAUSEN, G .

MATERIALS RESEARCH BULLETIN, 1988, 23 (05) :743-753

[10] DISPERSION AND DISTRIBUTION OF TITANIUM SPECIES BOUND TO SILICA FROM TICL4 [J].

HAUKKA, S ;

LAKOMAA, EL ;

JYLHA, O ;

VILHUNEN, J ;

HORNYTZKYJ, S .

LANGMUIR, 1993, 9 (12) :3497-3506