Absence of final-state screening shifts in photoemission spectroscopy frontier orbital alignment measurements at organic/semiconductor interfaces

被引:32
作者
Schlaf, R [1 ]
Parkinson, BA
Lee, PA
Nebesny, KW
Armstrong, NR
机构
[1] Colorado State Univ, Dept Chem, Ft Collins, CO 80523 USA
[2] Univ Arizona, Dept Chem, Tucson, AZ 85721 USA
基金
美国国家科学基金会;
关键词
growth photoelectron emission surface electronic phenomena; metal-semiconductor interfaces; metal-semiconductor nonmagnetic heterostructures; semiconducting films; surfaces and/or films; visible and ultraviolet photoelectron spectroscopy; work function measurements; X-ray photoelectron spectroscopy;
D O I
10.1016/S0039-6028(98)00850-4
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Chloroindium phthalocyanine (ClInPc) thin films were grown by vapor deposition on highly oriented pyrolytic graphite (HOPG) substrates. The alignment of the highest occupied and lowest unoccupied molecular orbitals (HOMO, LUMO) of the phthalocyanine layer relative to the Fermi level of the HOPG substrate was determined by combined X-ray and ultraviolet photoemission spectroscopy(XPS, UPS) measurements. The measurements revealed that the electronic structure of this interface is almost free of band bending, which results in only very weak shifts of the ClInPc-related XPS core-level peaks. Therefore, the influence of final-state screening shifts on orbital alignment measurements at organic/semiconductor interfaces with photoemission spectroscopy (PES) can be investigated in this system. The comparison of our results with PES measurements of monolayers and multilayers of xenon on palladium substrates revealed that final-state screening plays no or only an insignificant role within the accuracy that can be achieved in such measurements. (C) 1999 Elsevier Science B.V. All rights reserved.
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页码:L122 / L129
页数:8
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