Spatial light modulation based 3D lithography with single scan virtual layering

被引:4
|
作者
Seo, Manseung [1 ]
Kim, Haeryung [1 ]
机构
[1] Tongmyong Univ, Dept Robot Syst Engn, Pusan 608711, South Korea
关键词
Mask-less lithography; 3D lithography; Microfabrication; Spatial light modulator;
D O I
10.1016/j.mee.2010.12.112
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A novel spatial light modulation based 3D lithography method is proposed to fabricate both 2D and 3D microstructures using a single mechanism. To fabricate multiple layers with a single scan, a virtual layering concept based on super-resolution is devised. To design the hierarchical patterns appropriate to achieve the target irradiation energy determined from the target structure, the single scan virtual layering exposure model is developed. For verification of the proposed method, lithography simulations and experiments were performed to fabricate micro lens array structures. The surface smoothness and uniformity of the fabricated structures reveal that the method is versatile and reliable. (C) 2011 Elsevier B.V. All rights reserved.
引用
收藏
页码:2117 / 2120
页数:4
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