Visible light emission from porous silicon prepared by photoetching in alkaline solution

被引:3
|
作者
Adachi, S [1 ]
Tomioka, K [1 ]
机构
[1] Gunma Univ, Fac Engn, Dept Elect Engn, Kiryu, Gumma 3768515, Japan
关键词
D O I
10.1149/1.2001791
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
We demonstrate that spa water (Tenkeisen Spa water; TeSW) can be used as a solution for preparing porous silicon (PSi). The TeSW is a colorless alkaline solution. Photoetching is carried out on an n-type Si(111) wafer in TeSW under 5 mW He-Ne laser illumination. Photoluminescence from PSi shows a peak at similar to 1.95 eV at room temperature. The structural and optical properties of the TeSW-prepared PSi sample are nearly the same as those prepared in HF solution, although neither H+ nor F- is present in the spa water. This is the first report of preparing light-emitting PSi using alkaline solution. (c) 2005 The Electrochemical Society.
引用
收藏
页码:G251 / G253
页数:3
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