Magnetoresistance behavior of single castellated Ni80Fe20 nanowires

被引:21
|
作者
Adeyeye, AO
White, RL
机构
[1] Natl Univ Singapore, Dept Elect & Comp Engn, Informat Storage Mat Lab, Singapore 117576, Singapore
[2] Stanford Univ, Dept Mat Sci & Engn, Stanford Ctr Res Informat Storage Mat, Stanford, CA 94305 USA
关键词
Computer simulation - Electric contacts - Electron beam lithography - Magnetic anisotropy - Magnetic fields - Magnetic variables measurement - Magnetization - Magnetoresistance - Nickel alloys - Optical Kerr effect - Scanning electron microscopy - Temperature;
D O I
10.1063/1.1637726
中图分类号
O59 [应用物理学];
学科分类号
摘要
We have studied in a systematic way the magnetization reversal processes of single castellated Ni80Fe20 nanowires fabricated by advanced electron beam lithography. The structures consist of two 5 mum wide Ni80Fe20 support wires bridged with a castellated nanowire of width in the range from 80 to 150 nm. We have used the anisotropic magnetoresistance (AMR) effect as a probe of the spin orientations and hence magnetization reversal processes in these complex magnetic structures. When the applied fields are along the horizontal legs of the castellated nanowire, we observe a unique MR response due to the creation of magnetic local easy and hard axes resulting in a number of discontinuous jumps in the magnetoresistance. The magnetoresistance behavior is strongly influenced by spin states at corners of the nanowire for field applied parallel or perpendicular to horizontal legs. These results are in agreement with simple micromagnetic simulations. (C) 2004 American Institute of Physics.
引用
收藏
页码:2025 / 2028
页数:4
相关论文
共 50 条
  • [1] Magnetoresistance behavior of Ni80Fe20/Ru/Ni80Fe20 nanostripes
    Lupo, P.
    Liu, X. M.
    Adeyeye, A. O.
    EUROPEAN PHYSICAL JOURNAL PLUS, 2015, 130 (07):
  • [2] Magnetoresistance behavior of Ni80Fe20/Ru/Ni80Fe20 nanostripes
    P. Lupo
    X. M. Liu
    A. O. Adeyeye
    The European Physical Journal Plus, 130
  • [3] Magnetoresistance of closely packed Ni80Fe20 nanowires
    Goolaup, S
    Adeyeye, AO
    Singh, N
    THIN SOLID FILMS, 2006, 505 (1-2) : 29 - 34
  • [4] Magnetoresistance behavior of submicron Ni80Fe20 wires
    Adeyeye, AO
    Lauhoff, G
    Bland, JAC
    Daboo, C
    Hasko, DG
    Ahmed, H
    APPLIED PHYSICS LETTERS, 1997, 70 (08) : 1046 - 1048
  • [5] Dynamic behavior of Ni80Fe20 nanowires with controlled defects
    Ding, J.
    Demidov, V. E.
    Cottam, M. G.
    Demokritov, S. O.
    Adeyeye, A. O.
    APPLIED PHYSICS LETTERS, 2014, 104 (14)
  • [6] Tuning of interlayer exchange coupling in Ni80Fe20/Ru/Ni80Fe20 nanowires
    Liu, X. M.
    Lupo, P.
    Cottam, M. G.
    Adeyeye, A. O.
    JOURNAL OF APPLIED PHYSICS, 2015, 118 (11)
  • [7] Magnetoresistance of a mesoscopic Ni80Fe20 ring
    Buntinx, D.
    Volodin, A.
    Van Haesendonck, C.
    JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS, 2004, 272 : E1269 - E1271
  • [8] Characterization of electrodeposited Ni and Ni80Fe20 nanowires
    Leitao, D. C.
    Sousa, C. T.
    Ventura, J.
    Amaral, J. S.
    Carpinteiro, F.
    Pirota, K. R.
    Vazquez, M.
    Sousa, J. B.
    Araujo, J. P.
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 2008, 354 (47-51) : 5241 - 5243
  • [9] Magnetotransport behavior of Co nanowires coupled to Ni80Fe20 films
    Goolaup, S.
    Adeyeye, A. O.
    Singh, N.
    JOURNAL OF APPLIED PHYSICS, 2010, 107 (02)
  • [10] Magnetoresistance in modulated width Ni80Fe20 wires
    Yao, CC
    Hasko, DG
    Xu, YB
    Lee, WY
    Bland, JAC
    JOURNAL OF APPLIED PHYSICS, 1999, 85 (03) : 1689 - 1692