Wavefront measurement based on active deflectometry - art. no. 67232N

被引:3
作者
Liu, Yuankun [1 ]
Su, Xianyu [1 ]
Zhang, Qican [1 ]
机构
[1] Sichuan Univ, Optoelect Dept, Chengdu 610064, Sichuan, Peoples R China
来源
3RD INTERNATIONAL SYMPOSIUM ON ADVANCED OPTICAL MANUFACTURING AND TESTING TECHNOLOGIES: OPTICAL TEST AND MEASUREMENT TECHNOLOGY AND EQUIPMENT, PARTS 1-3 | 2007年 / 6723卷
关键词
wavefront measurement; deflectormetry; gradient; phase-shift calibration;
D O I
10.1117/12.783323
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
In this paper, a new wavefront measurement is proposed, which is based on active deflectometry and phase-shift technique. The deflections of imaging rays caused by a phase object could be measured accurately with the phase-shift technique and a removable TFT flat panel to display both the horizontal and vertical sinusoidal intensity patterns respectively, and then the wavefront distribution could be calculated. When a phase object is placed between a display and a calibrated CCD camera, the intensity patterns will be distorted. The distortion can be measured, and another different distortion can be got by moving the display. Then the ray deflections can be measured as well as the gradients of phase shift caused by the object. Therefore the wavefront can be reconstructed. Experimental results show the feasibility of this method. Compared with other techniques, this technique is simpler, cheaper and more flexible.
引用
收藏
页码:N7232 / N7232
页数:5
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