The microfabrication of capacitive ultrasonic transducers

被引:137
作者
Jin, XC [1 ]
Ladabaum, I [1 ]
Khuri-Yakub, BT [1 ]
机构
[1] Stanford Univ, EL Ginzton Lab, Stanford, CA 94305 USA
关键词
capacitive ultrasonic transducer; fabrication process; sacrificial etching; surface micromachining; vacuum sealing;
D O I
10.1109/84.709646
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Surface-micromachined capacitive ultrasonic transducers, which are suitable for operation in both air and water, have been fabricated and tested. Amorphous silicon is used as a sacrificial layer because of its good etching selectivity versus a nitride membrane, and improved cell-size control is obtained by lithographic definition of cavity walls. In addition, appropriate feature designs based on two-dimensional (2-D) process simulations make it possible to achieve device cavity sealing with g-line optical lithography, Transmission experiments in both water and air are presented. A dynamic range in excess of 110 dB is observed in air at 2.3 MHz, In water, a single pair of transducers is able to operate from 2 to 15 MHz. When tuned, a 3.5-MHz tone burst results in a received signal with better than 60-dB signal-to-noise ratio (SNR), The transducer behavior agrees with a theoretical understanding of transducer dynamics, The dynamic ranges achieved in this paper are the best reported to date for surface-micromachined capacitive ultrasonic transducers.
引用
收藏
页码:295 / 302
页数:8
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