Microwave heating behaviors of Si substrate materials in a single-mode cavity

被引:14
|
作者
Cao, Ziping [1 ]
Yoshikawa, Noboru [2 ]
Taniguchi, Shoji [2 ]
机构
[1] Tohoku Univ, Grad Sch Engn, Dept Nanomech, Aoba Ku, Sendai, Miyagi 9808579, Japan
[2] Tohoku Univ, Grad Sch Environm, Aoba Ku, Sendai, Miyagi 9808579, Japan
关键词
Microwave heating; Single-mode; Si substrate; AU THIN-FILMS; CERAMICS;
D O I
10.1016/j.matchemphys.2010.08.004
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Microwave heating behaviors of Si substrate materials were investigated in both H and E field The temperature curves could be divided into three stages in H field but two stages in E field according to the changing heating rate With the increase of the Si plate thickness the heating efficiency gradually decreases in both H and E field The boron doping in Si has also an evident influence on the heating behaviors and leads to the reduction of the maximal temperature in the heating curve By contrast a thin Au layer deposited on the Si plate can significantly promote the heating efficiency in H field For all samples although higher microwave power is used for E field heating the maximal temperature of the same sample heated at the E maximum was lower than that at the H maximum confirming that the heating of H field is more effective than that of E field for a high electric conductive sample and reversely E field heating is more superior for a low conductive one (c) 2010 Elsevier B V All rights reserved
引用
收藏
页码:900 / 903
页数:4
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